2009
DOI: 10.1016/j.apsusc.2009.08.018
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Transparent conductive ZnO:Ga films prepared by DC reactive magnetron sputtering at low temperature

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Cited by 47 publications
(30 citation statements)
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“…1, inset). Also, the defects such as dislocations, interstitials, vacancies, and Ga substitution induce the scattering of carriers and act as traps making carriers inactive [43].…”
Section: Characterization Of Ga 2 O 3 -Zno Nanohybridsmentioning
confidence: 99%
“…1, inset). Also, the defects such as dislocations, interstitials, vacancies, and Ga substitution induce the scattering of carriers and act as traps making carriers inactive [43].…”
Section: Characterization Of Ga 2 O 3 -Zno Nanohybridsmentioning
confidence: 99%
“…Among these elements, Ga and Al have been extensively used as n-type dopants. In particular, Ga-doped ZnO (GZO) films have several merits such as higher resistance to oxidation and less lattice deformation compared to Al-doped ZnO (AZO) films [1,2].…”
Section: Introductionmentioning
confidence: 99%
“…On the other hand, further increase of energy in the case of higher growth temperature over 400°C could result in the breaking of the bonding of Zn-O and re-evaporation of the deposited films rather than enabling the atoms to move to their stable sites [12,24], so as to decrease the orientation factor of (002) direction. Zhang et al [25] and Zhong et al [22] reported similar result in researching the influence of growth temperature on the structural properties of Al-doped ZnO thin films.…”
Section: Thin Films Characterizationmentioning
confidence: 99%
“…25. Bie et al [12] studied the physical properties of GZO films prepared by DC reactive magnetron sputtering. They found that the substrate temperature have an important impact on the properties of GZO thin films.…”
Section: Introductionmentioning
confidence: 99%
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