“…Besides high conductivity and optical transmittance in the visible region, the GZO thin films have a lot of advantages, such as low cost, non-toxicity, material abundance and high stability under hydrogen plasma, compared to ITO thin films. For the preparation of GZO thin films, there are many deposition techniques currently in use, for instance, RF magnetron sputtering [9][10][11], DC magnetron sputtering [12], spray pyrolysis [13], pulsed laser deposition [14], sol-gel process [15] and atomic * E-mail: jhgalpha@163.com layer deposition [16]. Up to now, many research groups have reported the effect of deposition conditions on the properties of GZO thin films prepared by different methods.…”