Transparent conductive film having sandwich structure of gallium–indium-oxide/silver/gallium–indium-oxide

Abe, Yoshiyuki; Nakayama, Tokuyuki

doi:10.1016/j.matlet.2006.12.053

Cited by 23 publications

(5 citation statements)

References 9 publications

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“…In part f of Figure , pronounced signals due to In (3.29 and 3.57 keV) were observed. This is most likely explained by the contamination by indium in the ITO substrate plate and its conversion to indium-gallium-oxides − during the hybridization reaction.…”

Section: Resultsmentioning

confidence: 99%

Polycarbazole Nanocomposites with Conducting Metal Oxides for Transparent Electrode Applications

Hoshino

Yazawa

Tanaka

et al. 2010

ACS Appl. Mater. Interfaces

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The preparation and characterization of conducting polycarbazole (PCz) hybrid films with a colorless transparency are described. They were prepared by the vacuum evaporation of tin, aluminum, or gallium onto anion-doped green-colored PCz films, or by applying gallium to the films, followed by their exposure to ambient air. The resultant hybrid films consisting of an undoped PCz backbone and metal compounds exhibited good transparencies (90-95% at a wavelength of 550 nm). The hybrid films have a specific cross-sectional structure in which the small regions of the metal compounds are dispersed in the PCz backbone. The hybridization reaction was mechanistically explained on the basis of the combination of a metal corrosion reaction and polymer dedoping reaction, which was successfully supported by the chemical analyses of the hybrid films. The electric conductivities of the hybrid films, measured by a four-point-probe method, ranged from 2.2 x 10(-4) to 6.0 x 10(-3) S cm(-1), which are considered to be the lowest limit because the use of the hybrid films as an electrochemical electrode reveals that a network of conductive paths is preferentially formed in the film thickness direction rather than in the in-plane direction.

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Section: Resultsmentioning

confidence: 99%

Polycarbazole Nanocomposites with Conducting Metal Oxides for Transparent Electrode Applications

Hoshino

Yazawa

Tanaka

et al. 2010

ACS Appl. Mater. Interfaces

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“…Previously the use of Ag as the intermediate layer showed a wavelength dependent transmittance favoring the blue region (400 to 500 nm) of the visible spectrum, and the application of this structure as a cathode in place of the typical Al or Ag. 10 By contrast, replacing this layer with Au and sandwiching it between layers of molybdenum oxide (MoO 3 ), we have shown a shift in peak transmittance toward the green and red regions (550 to 600 nm) of the spectrum, while maintaining a low sheet resistance. Furthermore, when ultrathin layers of Au and Ag are stacked in this structure, the peak transmittance can be both broadened and tuned based on the proportions of each layer.…”

Section: Introductionmentioning

confidence: 87%

“…[10][11][12][13][14] While these electrodes have typically been deposited using e-beam deposition and therefore require additional processing steps and chambers apart from traditional thermal evaporation, Yook et al have shown that such a structure can be thermally evaporated as well, which integrates into the fabrication of small molecule organic devices and has less potential to damage the underlying layers. 12 Typically the metal used has been Ag, while the oxide layers have run the gamut from ITO to WO 3 to ZnO.…”

Section: Introductionmentioning

confidence: 99%

Transparent oxide/metal/oxide trilayer electrode for use in top-emitting organic light-emitting diodes

et al. 2011

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Abstract. The most commonly used transparent electrode, indium-tin oxide (ITO), is costly and requires methods of deposition that are highly destructive to organic materials when it is deposited on top of the organic layers in top-emitting organic light-emitting devices (OLEDs).Here we have employed a trilayer electrode structure consisting of a thin layer of metal sandwiched between two MoO 3 layers, which can be deposited through vacuum thermal evaporation without much damage to the organic active layers. Such MoO 3 /Au/MoO 3 trilayer electrodes have a maximum transmittance of nearly 90% at 600 nm and a sheet resistance of <10 ohms per square ( /sq) with a 10-nm thick Au intermediate layer. Using these trilayers as the top transparent anode, we have fabricated top-emitting OLEDs based on either a fluorescent or phosphorescent emitter, and observed nearly identical emission spectra and similar external quantum efficiencies as compared to the more conventional bottom-emitting OLEDs based on the commercial ITO anode. The power efficiency of the top-emitting devices is 20% to 30% lower than the bottom-emitting devices due to the somewhat inferior charge injection in the topemitting devices. The performance and emission characteristics of these devices indicate that this trilayer structure is a promising candidate as a transparent anode in top-emitting OLEDs.

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“…They have low optical absorption in both the visible and infrared ranges . Using appropriate optical coatings, such as a sandwich structure, the reflectance and transmittance of the stack can be engineered for specific applications (e.g., low-emissive glass). − Furthermore, silver is highly ductile and durable, making it ideal for flexible electronics. , In addition, ultra-thin silver has a high plasmonic figure of merit, making it useful for plasmonic applications. − …”

Section: Introductionmentioning

confidence: 99%

Stable Ultra-thin Silver Films Grown by Soft Ion Beam-Enhanced Sputtering with an Aluminum Cap Layer

Tran

Shrestha

Baule

et al. 2023

ACS Appl. Mater. Interfaces

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Ultra-thin silver films are susceptible to ambient environments and form grayish layers in the silver mirroring process. The poor wettability together with the high diffusivity of surface atoms in the presence of oxygen accounts for the thermal instability of ultra-thin silver films in the air and at elevated temperatures. This work demonstrates an atomic-scale aluminum cap layer on the silver to enhance the thermal and environmental stabilities of ultra-thin silver films deposited by sputtering with the assistance of a soft ion beam reported in our previous work. The resulted film consists of an ion-beam-treated seed silver layer of ∼1 nm nominal thickness, a subsequent silver layer of ∼6 nm thickness produced by sputtering alone, and an aluminum cap layer of ∼0.2 nm nominal thickness. Although the aluminum cap is only one to two atomic layers and likely non-continuous, it significantly improved the thermal and ambient environmental stability of the ultra-thin silver films (∼7 nm thick) without affecting the film's optical and electrical properties. The improved environmental stability is attributed to the cathodic protection mechanism and reduced diffusivity of surface atoms. The improved thermal stability is attributed to the reduced mobility of surface atoms in the presence of aluminum atoms. Thermal treatment of the duplex film also improves the film's electrical conductivity and optical transmittance by enhancing its crystallinity. The annealed aluminum/silver duplex structure has exhibited the lowest electric resistivity among the reported ultra-thin silver films and high optical transmittance similar to the simulated theoretical results.

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Transparent conductive film having sandwich structure of gallium–indium-oxide/silver/gallium–indium-oxide

Cited by 23 publications

References 9 publications

Polycarbazole Nanocomposites with Conducting Metal Oxides for Transparent Electrode Applications

Polycarbazole Nanocomposites with Conducting Metal Oxides for Transparent Electrode Applications

Transparent oxide/metal/oxide trilayer electrode for use in top-emitting organic light-emitting diodes

Stable Ultra-thin Silver Films Grown by Soft Ion Beam-Enhanced Sputtering with an Aluminum Cap Layer

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