Transparent conducting oxides for electro-optical plasmonic modulators

Babicheva, Viktoriia E.; Boltasseva, Alexandra; Lavrinenko, Andrei V.

doi:10.1515/nanoph-2015-0004

Cited by 158 publications

(126 citation statements)

References 172 publications

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“…Common metals used in nanoplasmonic waveguides are gold (Au), silver (Ag), copper (Cu), and aluminum (Al). More recently, transparent conductive oxides and other exotic materials have been proposed as plasmonic materials for near-to mid-infrared signals [37][38][39]. The choice of dielectric materials that are used to load the nanoplasmonic waveguides depends largely on the intended function of the nanoplasmonic waveguide.…”

Section: Passive Routingmentioning

confidence: 99%

Integrated nanoplasmonic waveguides for magnetic, nonlinear, and strong-field devices

et al. 2016

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Abstract:As modern complementary-metal-oxide-semiconductor (CMOS) circuitry rapidly approaches fundamental speed and bandwidth limitations, optical platforms have become promising candidates to circumvent these limits and facilitate massive increases in computational power. To compete with high density CMOS circuitry, optical technology within the plasmonic regime is desirable, because of the sub-diffraction limited confinement of electromagnetic energy, large optical bandwidth, and ultrafast processing capabilities. As such, nanoplasmonic waveguides act as nanoscale conduits for optical signals, thereby forming the backbone of such a platform. In recent years, significant research interest has developed to uncover the fundamental physics governing phenomena occurring within nanoplasmonic waveguides, and to implement unique optical devices. In doing so, a wide variety of material properties have been exploited. CMOS-compatible materials facilitate passive plasmonic routing devices for directing the confined radiation. Magnetic materials facilitate time-reversal symmetry breaking, aiding in the development of nonreciprocal isolators or modulators. Additionally, strong confinement and enhancement of electric fields within such waveguides require the use of materials with high nonlinear coefficients to achieve increased nonlinear optical phenomenon in a nanoscale footprint. Furthermore, this enhancement and confinement of the fields facilitate the study of strong-field effects within the solid-state environment of the waveguide. Here, we review current stateof-the-art physics and applications of nanoplasmonic waveguides pertaining to passive, magnetoplasmonic, nonlinear, and strong-field devices. Such components are essential elements in integrated optical circuitry, and each fulfill specific roles in truly developing a chip-scale plasmonic computing architecture.

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Section: Passive Routingmentioning

confidence: 99%

Integrated nanoplasmonic waveguides for magnetic, nonlinear, and strong-field devices

et al. 2016

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“…Although there are tests [11] showing improvement of gold adhesion on silica by using amino-silanes, the limits of Au deposition and a comparison with mercaptosilanes have not yet been investigated. We tested four different chemicals: (3- 3 , 97%. For reference, a standard untreated silicon sample was used.…”

Section: Ultrathin Gold Layersmentioning

confidence: 99%

“…Among main research directions where thin films are employed we mention noble metal layers to support surface plasmon polariton propagation in different configurations [1], transparent conductive oxides films for electrodes and for active modulators based on changing the carriers concentration [2,3], and multiple metal-dielectric pairs for hyperbolic metamaterials in the infra-red and visible ranges [4]. Increasing efforts are made in order not only to improve the quality of the deposited layers, but also to diminish their thickness and to find new materials for these fields.…”

Section: Introductionmentioning

confidence: 99%

Ultra-thin metal and dielectric layers for nanophotonic applications

Shkondin

Leandro

Malureanu

et al. 2015

2015 17th International Conference on Transparent Optical Networks (ICTON)

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In our talk we first give an overview of the various thin films used in the field of nanophotonics. Then we describe our own activity in fabrication and characterization of ultra-thin films of high quality. We particularly focus on uniform gold layers having thicknesses down to 6 nm fabricated by e-beam deposition on dielectric substrates and Al-oxides/Ti-oxides multilayers prepared by atomic layer deposition in high aspect ratio trenches. In the latter case we show more than 1:20 aspect ratio structures can be achieved. Keywords: ultrathin layers, atomic layer deposition, gold, alumina, titania deposition. INTRODUCTIONUltra-thin films made of metals, semiconductors or dielectrics are on permanent demand for different purposes in modern nanophotonics. Among main research directions where thin films are employed we mention noble metal layers to support surface plasmon polariton propagation in different configurations [1], transparent conductive oxides films for electrodes and for active modulators based on changing the carriers concentration [2,3], and multiple metal-dielectric pairs for hyperbolic metamaterials in the infra-red and visible ranges [4]. Increasing efforts are made in order not only to improve the quality of the deposited layers, but also to diminish their thickness and to find new materials for these fields.Plasmon optics or plasmonics is currently considered as one of the principle direction of advancing waveguides and interconnects in nanophotonics. It lives through a revival period after its first successful appearance in the 80-s of the last century. Plasmonics has the full potential to become one of the nanophotonics key instruments to reach extreme light localization, deep subwavelength resolution and enhanced light emission [5]. Such properties stem from light-free electron coupling occurring at metal-dielectric interfaces. The carriers of such interactions are surface plasmons, which occur in two basic configurations: localized surface plasmons with deep analogy in mechanical oscillations and surface plasmon-polaritons (SPPs) or propagating surface plasmons analogous to mechanical waves.However, the main trade-off of plasmonics was obvious from the very beginning: losses versus confinement. The more the plasmons are confined to the interface the bigger the losses. The latter are conventionally associated with the process of free electrons transport or displacement in metals followed by electron-electron and electron-phonon scattering. Apart from this SPPs loss channel, which exists even in the ideal case of perfectly smooth metal layers interfaces, intensive scattering of surface plasmons on possible surface/bulk imperfections and defects, including the ones of extremely small sizes (of a nanometer scale, like metal grains), add more loss channels. These loss channels are a direct consequence of big wavevectors of SPPs in comparison with light waves of the same frequency [6].Thus advancing in terms of plasmonic circuitry inevitably brings a challenge of fabricating interfaces as fl...

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“…The silicon HPWG, which usually has a metal strip, a silicon core, and an silicon oxide (SiO 2 ) insulator layer between them, was proposed as a novel waveguide with nanoscale light confinement as well as relatively long propagation distance [46] and has become very popular for integrated nanophotonics in the past years [60][61][62][63][64][65]. Meanwhile, plasmonic structures and waveguides are also promising candidates for the application at mid-IR wavelength [66,67].…”

Section: Introductionmentioning

confidence: 99%

Ultracompact on-chip photothermal power monitor based on silicon hybrid plasmonic waveguides

Shi

et al. 2017

Nanophotonics

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Abstract:We propose and demonstrate an ultracompact on-chip photothermal power monitor based on a silicon hybrid plasmonic waveguide (HPWG), which consists of a metal strip, a silicon core, and a silicon oxide (SiO 2 ) insulator layer between them. When light injected to an HPWG is absorbed by the metal strip, the temperature increases and the resistance of the metal strip changes accordingly due to the photothermal and thermal resistance effects of the metal. Therefore, the optical power variation can be monitored by measuring the resistance of the metal strip on the HPWG. To obtain the electrical signal for the resistance measurement conveniently, a Wheatstone bridge circuit is monolithically integrated with the HPWG on the same chip. As the HPWG has nanoscale light confinement, the present power monitor is as short as ~ 3 μm, which is the smallest photothermal power monitor reported until now. The compactness helps to improve the thermal efficiency and the response speed. For the present power monitor fabricated with simple fabrication processes, the measured responsivity is as high as about 17.7 mV/mW at a bias voltage of 2 V and the power dynamic range is as large as 35 dB.

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Transparent conducting oxides for electro-optical plasmonic modulators

Cited by 158 publications

References 172 publications

Integrated nanoplasmonic waveguides for magnetic, nonlinear, and strong-field devices

Integrated nanoplasmonic waveguides for magnetic, nonlinear, and strong-field devices

Ultra-thin metal and dielectric layers for nanophotonic applications

Ultracompact on-chip photothermal power monitor based on silicon hybrid plasmonic waveguides

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