2017
DOI: 10.1103/physrevapplied.8.054047
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Transistor Concepts Based on Lateral Heterostructures of Metallic and Semiconducting Phases of MoS2

Abstract: In this paper we propose two transistor concepts based on lateral heterostructures of monolayer MoS2, composed of adjacent regions of 1T (metallic) and 2H (semiconducting) phases, inspired by recent research showing the possibility to obtain such heterostructures by electron beam irradiation. The first concept, the lateral heterostructure field-effect transistor, exhibits potential of better performance with respect to the foreseen evolution of CMOS technology, both for high performance and low power applicati… Show more

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Cited by 43 publications
(50 citation statements)
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“…4b) in TMD films is in the range from 1 to 4 nm for TMDs and of 20-100 nm for graphene, as extracted from mobility data of Fig. 4a, which is comparable to the channel or barrier region of a 2D heterostructure-based transistor [22][27] [24][31] [70]. This suggests that transport will be dominated by the quality of the lateral heterojunctions, which are, however, still insufficiently controlled and understood.…”
Section: Figurementioning
confidence: 81%
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“…4b) in TMD films is in the range from 1 to 4 nm for TMDs and of 20-100 nm for graphene, as extracted from mobility data of Fig. 4a, which is comparable to the channel or barrier region of a 2D heterostructure-based transistor [22][27] [24][31] [70]. This suggests that transport will be dominated by the quality of the lateral heterojunctions, which are, however, still insufficiently controlled and understood.…”
Section: Figurementioning
confidence: 81%
“…In vertical [22][27] [24] and lateral [28][30] [31][32] [70] heterostructure FETs, the channel consists of a material with a larger gap than that used in the source and drain regions. In both cases, the voltage applied to the top gate modulates the energy barrier height and therefore the current.…”
Section: Vertical and Lateral Heterostructure Field Effect Transistorsmentioning
confidence: 99%
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“…Next, we choose the U (k) using some deliberate strategies to minimize the spatial spreads of the Wannier functions. [151] They declared that attentions should be paid to the off-diagonal elements con-necting the two different materials and used the off-diagonal elements of the MoS 2 -2H's in the interface (Figure 10d). This procedure is called the maximally localized Wannier functions (MLWFs) method.…”
Section: Quantum Transport Modeling Toward Tfetsmentioning
confidence: 99%
“…Transistor structures with TMDC monolayer forming active area in tunnel FETs are being developed [25], also with vertical TMDCs heterostructures [26,27]. The more intriguing lateral, in-plane TMDCs heterojunctions are also constructed, enabling interesting 1D physics at interfaces [28], or leading to improved FETs switching characteristics [29][30][31].…”
Section: Introductionmentioning
confidence: 99%