Strained III-V layers develop a charge polarization vector for all orientations except for the standard (001) one. Besides, by selecting the crystal orientation, a valence band engineering can be made, to exploit sub-band splitting and their anisotropies. Piezoelectric devices have shown superior performances in modulators, SEED'S and HEMT's. Besides, very low threshold current have been achieved in strained lasers when grown along orientations different from the (001). It has been shown that the piezoelectric electric field is only partially screened at lasing. Polarization control in VCSEL's, and double harmonic generation, have also been proposed as another areas of application for structures grown along non-(001) surfaces.In the search for new and improved electronic and optoelectronic devices, engineers have develop different tools (materials/alloys, heterojunctions, quantum confinement), and recently strain was incorporated. Crystal orientation is as a new tool, and strained low-dimensionality structures grown along non-(00 1) orientations offer new and interesting possibilities. Although it was well known that HI-V semiconductors were piezoelectric materials, the indication that strained 111-V layers will develop very important piezoelectric fields (PEF), except for the standard (001) orientation was published about a decade ago [l]. In general, interface polarization charges, and hence piezoelectric fields, will be developed in strained structures along non-standard index surfaces (NIS), and they are maximum for growth along the (1 1 1) direction. For the InGaAs/GaAs systems, piezoelectric fields as large as 4 x lo5 V/cm were predicted and experimentally confirmed [2].In quantum confined structures, the use of pseudomorphically strained layers along directions other than (OOl), incorporate a number of potential benefits: a) the presence of built-in piezoelectric fields that can be controlled in sense and also modulated externally; b) a valence band structure with a larger HH-LH subband splitting, that leads to a lower in-plane hole effective mass density of states and to an enhancement of the TE polarization mode, and with a significant anisotropy that allows to control the in-plane polarization angle; c) a lower impurity incorporation (a reduced C concentration has been claimed for GaAs (1 1 l)B orientation); d) a dopant site incorporation that depends on substrate orientation and growth conditions, and that may lead to an enhanced amphoteric behavior of certain species; e) for these non-(001) orientations, the critical layer thickness may be larger than for the (1 00) orientation, allowing the growth of new pseudomorphic structures; and, f) for proper orientations, the presence of optical matrix elements that enhance the oscillator strength. Most of the experimental work on NIS has been made on GaAs-based structures, although the use of InP substrates is attracting a growing attention.A basic structure to study the PEF fingerprints is to embed one or several strained QW's into the intrinsic region of a ...