2013
DOI: 10.1063/1.4824169
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Transient behavior in Pt/Nb-doped SrTiO3 Schottky junctions

Abstract: We investigated the transient behavior of Pt/Nb-doped SrTiO3 Schottky junctions that exhibit rectifying and hysteric I-V characteristics. We found that regardless of the junction resistance state, the junction under the bias shows the relaxation behavior over 104 s while the behavior is strongly dependent on the junction resistance state. Detailed investigation of the time dependence of the current and the capacitance of the junctions indicates that the junctions have the inhomogeneous Schottky barrier heights… Show more

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Cited by 22 publications
(30 citation statements)
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“…The junction capacitances of Pt/TaO x (10 nm)/Nb:STO were significantly reduced compared with those of Pt/Nb:STO junctions (≈210 pF at 0 V compared with ≈450 pF at 0 V), but showed no clear dependence on r O2 for r O2 values of 10–50% (Figure (b)). With regard to the devices’ capacitances, only small differences (≈several percent) were observed between the high resistance state (HRS, after negative voltages) and low resistance state (LRS, after positive voltages), in agreement with previous reports . The capacitance independence of r O2 suggests that the dielectric constants, carrier concentrations, and built‐in potentials (determined form the abscissa intercepts in C −2 – V plots) of the Pt/TaO x /Nb:STO junctions do not have a systematic relationship with r O2 in the r O2 range of 10–50%.…”
supporting
confidence: 88%
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“…The junction capacitances of Pt/TaO x (10 nm)/Nb:STO were significantly reduced compared with those of Pt/Nb:STO junctions (≈210 pF at 0 V compared with ≈450 pF at 0 V), but showed no clear dependence on r O2 for r O2 values of 10–50% (Figure (b)). With regard to the devices’ capacitances, only small differences (≈several percent) were observed between the high resistance state (HRS, after negative voltages) and low resistance state (LRS, after positive voltages), in agreement with previous reports . The capacitance independence of r O2 suggests that the dielectric constants, carrier concentrations, and built‐in potentials (determined form the abscissa intercepts in C −2 – V plots) of the Pt/TaO x /Nb:STO junctions do not have a systematic relationship with r O2 in the r O2 range of 10–50%.…”
supporting
confidence: 88%
“…These phenomena are known to cause “interface‐type” resistive switching, which has been actively investigated for its applications in memory and neuromorphic devices owing to its intrinsic multi‐level/analog switching capability . Pt/Nb‐doped SrTiO 3 (Nb:STO) junctions are known to show clear interfacial resistive switching under reverse bias with relatively high performances . However, the controllability and reproducibility of the resistive switching of Pt/Nb:STO is poor because they are highly sensitive to fabrication conditions .…”
mentioning
confidence: 99%
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“…The increase in n and the lowering of φ B on switching the junction to the LRS are generally observed for this type of resistive switching memory. It has been ascribed to barrier inhomogeneity811181920, because the global φ B as measured in photocurrent experiments is insensitive to resistive switching1921.…”
Section: Resultsmentioning
confidence: 99%
“…One extensively studied type of resistive switching device consists of a Schottky junction between a doped, wide-band gap oxide, such as SrTiO 3 , and high work-function metals such as Pt, Au or metallic oxides such as SrRuO 3 and YBa 2 Cu 3 O 7− x 6789. In such devices, resistive switching is accompanied by a modulation of the effective Schottky barrier height78101112. These devices combine technologically attractive features, such as hysteretic current–voltage ( I – V ) characteristics with large on/off ratios, bipolar switching and continuously tunable resistance states.…”
mentioning
confidence: 99%