Abstract:Transferable Ga2O3 thin film membrane
is
desirable for vertical and flexible solar-blind photonics and high-power
electronics applications. However, Ga2O3 epitaxially
grown on rigid substrates such as sapphire, Si, and SiC hinders its
exfoliation due to the strong covalent bond between Ga2O3 and substrates, determining its lateral device configuration
and also hardly reaching the ever-increasing demand for wearable and
foldable applications. Mica substrate, which has an atomic-level flat
surface and high-tempe… Show more
“…It is evident that our detector displays excellent performance compared to other Ga 2 O 3 detectors that utilize graphene as the transparent electrode. 9,11,20,[24][25][26][46][47][48][49][50][51][52][53][54][55][56][57]…”
“…It is evident that our detector displays excellent performance compared to other Ga 2 O 3 detectors that utilize graphene as the transparent electrode. 9,11,20,[24][25][26][46][47][48][49][50][51][52][53][54][55][56][57]…”
“…Optical image of flexible solar-blind photodetectors using β-Ga 2 O 3 epilayer [ 34 ], d . UV light on/off cyclic tests of flexible Ga 2 O 3 photodetector [ 81 ], e . I-V ds characteristics of WS 2 epilayer-based photodetector according to V gs [ 82 ], f .…”
Section: Applicationsmentioning
confidence: 99%
“…Oxide nanomembranes have been also considered as promising materials for achieving 3D hetero-integrated optoelectronic systems. The oxide thin-films were grown by the vdW epitaxy, and transferred to flexible substrates for demonstrating the practical optoelectronic applications [ 34 , 81 ]. A flexible solar-blind photodetector was realized by using a large-scale β-Ga 2 O 3 film which was grown by the vdW epitaxy on a compressive-strained epitaxial graphene as shown in Fig.…”
Section: Applicationsmentioning
confidence: 99%
“…The flexible device displayed excellent photosensitivity of 151.1 A/W at a wavelength of 250 nm due to the wide band gap (~ 4.9 eV) of the β-Ga 2 O 3 nanomembrane. The vdW epitaxy of β-Ga 2 O 3 thin-film could be applied to the mica substrate as well as the structure of 2D material/mother substrate because the mica wafer had a stacked structure of 2D-like thin framework layers [ 81 ]. The β-Ga 2 O 3 thin-film grown on the mica was easily exfoliated by mechanical stress from a metal/adhesive tape-structured film, which could be accomplished by intentional destruction of weak vdW bindings between the mica layers.…”
Epitaxy technology produces high-quality material building blocks that underpin various fields of applications. However, fundamental limitations exist for conventional epitaxy, such as the lattice matching constraints that have greatly narrowed down the choices of available epitaxial material combinations. Recent emerging epitaxy techniques such as remote and van der Waals epitaxy have shown exciting perspectives to overcome these limitations and provide freestanding nanomembranes for massive novel applications. Here, we review the mechanism and fundamentals for van der Waals and remote epitaxy to produce freestanding nanomembranes. Key benefits that are exclusive to these two growth strategies are comprehensively summarized. A number of original applications have also been discussed, highlighting the advantages of these freestanding films-based designs. Finally, we discuss the current limitations with possible solutions and potential future directions towards nanomembranes-based advanced heterogeneous integration.
Graphical Abstract
“…[1][2][3][4][5][6] β-Ga 2 O 3 wide-band-gap semiconductor material is one of the fastest-developing semiconductor materials in the field of power electronics. [7][8][9][10] Compared with GaN, SiC, and other third-generation semiconductor materials, β-Ga 2 O 3 possesses superior material properties. Ga 2 O 3 has a wider band gap width (∼4.9 eV), high breakdown field strength (∼8 MV cm −1 ), and higher Baliga's figure-of-merit (BFOM, ∼3444).…”
We compared the crystal properties of the blue area grown before high-temperature remelting and the colorless area after high-temperature remelting through characterization tests, such as AFM, XRD, PL, ICP, LCM, and HALL.
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