2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference 2009
DOI: 10.1109/asmc.2009.5155982
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Towards identification of latent defects: Yield mining using defect characteristic model and clustering

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Cited by 5 publications
(2 citation statements)
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“…It is found that defect density near wafer edge tends to be distributed randomly, while at the wafer center tends to be cluster. And cluster also has several distinct patterns, such as blob, edge, scratch, hat and so on [16].…”
Section: Proposed Yield Modelmentioning
confidence: 99%
“…It is found that defect density near wafer edge tends to be distributed randomly, while at the wafer center tends to be cluster. And cluster also has several distinct patterns, such as blob, edge, scratch, hat and so on [16].…”
Section: Proposed Yield Modelmentioning
confidence: 99%
“…Similarly, [ 12 ] show a strong correlation between probe data and device reliability. In [ 13 ] is investigated the use of defect characteristic models as yield models to screen latent defects for wafers with defect clusters. They propose and utilize a yield mining framework that guides manufacturers in determining if their device has a spatial relationship between the probe defects and latent defects.…”
Section: Introductionmentioning
confidence: 99%