Topical Review: Design, Fabrication, and Applications of Hybrid Nanostructured Array

Zhu, Song; Zhou, Wei

doi:10.1155/2012/206069

Cited by 2 publications

(2 citation statements)

References 49 publications

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“…However, it is limited by the light wavelength in fabrication and the huge cost. Nanosphere lithography has been widely used in the fabrication of periodic nanopatterns for its low cost and good controllability [14][15][16][17][18][19]. Manufacturing efficiency may be the biggest problem commonly encountered [2,3,9].…”

Section: Introductionmentioning

confidence: 99%

Simple, Fast, and Cost‐Effective Fabrication of Wafer‐Scale Nanohole Arrays on Silicon for Antireflection

Dong

et al. 2014

Journal of Nanomaterials

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A simple, fast, and cost-effective method was developed in this paper for the high-throughput fabrication of nanohole arrays on silicon (Si), which is utilized for antireflection. Wafer-scale polystyrene (PS) monolayer colloidal crystal was developed as templates by spin-coating method. Metallic shadow mask was prepared by lifting off the oxygen etched PS beads from the deposited chromium film. Nanohole arrays were fabricated by Si dry etching. A series of nanohole arrays were fabricated with the similar diameter but with different depth. It is found that the maximum depth of the Si-hole was determined by the diameter of the Cr-mask. The antireflection ability of these Si-hole arrays was investigated. The results show that the reflection decreases with the depth of the Si-hole. The deepest Si-hole arrays show the best antireflection ability (reflection < 9%) at long wavelengths (>600 nm), which was about 28 percent of the nonpatterned silicon wafer’s reflection. The proposed method has the potential for high-throughput fabrication of patterned Si wafer, and the low reflectivity allows the application of these wafers in crystalline silicon solar cells.

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Section: Introductionmentioning

confidence: 99%

Simple, Fast, and Cost‐Effective Fabrication of Wafer‐Scale Nanohole Arrays on Silicon for Antireflection

Dong

et al. 2014

Journal of Nanomaterials

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“…These hybrid structures enhances the efficiency of light harvesting either via Plasmon excitation in metals or absorption tunability characteristics of semiconductors. Such hybrid systems, through combining the properties of the constituents, provide a novel paradigm for designing photovoltaic devices.Shaoli Zhu et al[127] reviewed the design, fabrication and applications of hybrid Au-Ag triangular nanostructures. The hybrid nanostructure (Au-Ag triangular nanostructure) is prepared using Nanosphere Lithography technique.…”

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confidence: 99%

A new approach to fabricate PDMS structures using femtosecond laser

Selvaraj¹

2021

Preprint

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Polydimethylsiloxane (PDMS) is commonly used to prototype micro and nano featured components due to its beneficial properties. PDMS based devices have been used for diverse applications such as cell culturing, cell sorting and sensors. Motivated by such diverse applications possible through pure PDMS and reinforced PDMS, numerous efforts have been directed towards developing novel fabrication techniques. Prototyping 2D and 3D pure and reinforced PDMS microdevices normally require a long curing time and must go through multiple steps. This research explores the possibility of fabricating microscale and nanoscale structures directly from PDMS resin using femtosecond laser processing. This study offers an alternative fabrication route that potentially lead to a new way for prototyping of pure and reinforced PDMS devices, and the generation of hybrid nanomaterials. In depth investigation of femtosecond laser irradiation of PDMS resin reveals that the process is highly intensity-dependent. At low to intermediate intensity regime, femtosecond laser beam is able to rapidly cure the resin and create micron-sized structures directly from PDMS resin. At higher intensity regime, a total break-down of the resin material occurs and leads to the formation of PDMS nanoparticles. This work demonstrates a new way of rapid curing of PDMS resin on a microsecond timescale using femtosecond laser irradiation. The proposed technique permits maskless single-step curing and is capable of fabricating 2D and 3D structures in micro-scale. Reinforced PDMS microstructures also have been fabricated through this method. The proposed technique permits both reinforcement and rapid curing and is ideal for fabricating reinforced structures in microscale. The strength of the nanofiber reinforced PDMS microstructures has been investigated by means of Nanoindentation test. The results showed significant improvement in strength of the material. Hybrid PDMS-Si and hybrid PDMS-Al nanoparticle aggregate were generated using femtosecond laser. The results indicate that the hybrid PDMS nanostructures are clusters of nanoparticles that agglomerate and interweave three-dimensionally and also the possibility of formation of Si/Al nanoparticles enclosed in PDMS Shells. Presence of PDMS in the final hybrid structure is confirmed by micro-raman analysis. The versatility of our technique opens a new pathway to generate hybrid 3D fibrous nanostructures on any materials.

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Topical Review: Design, Fabrication, and Applications of Hybrid Nanostructured Array

Cited by 2 publications

References 49 publications

Simple, Fast, and Cost‐Effective Fabrication of Wafer‐Scale Nanohole Arrays on Silicon for Antireflection

Simple, Fast, and Cost‐Effective Fabrication of Wafer‐Scale Nanohole Arrays on Silicon for Antireflection

A new approach to fabricate PDMS structures using femtosecond laser

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