(TMT)_n clusters as dilute debris‐free tin source for generation of multiply charged tin ions of relevance in extreme ultraviolet (EUV) lithography, under intense laser irradiation

Abstract

Tetramethyltin clusters have the potential to act as dilute and debris-free source for EUV lithographic applications, in contrast to bulk tin targets. The inherent properties of clusters, such as higher local density and the pulsed nature of the cluster source, are appropriate for EUV lithographic applications.