Abstract:High temperature titanium nitriding is achieved by plasmas sustained at atmospheric pressure in a microwave resonant cavity. TiN layers produced in the temperature range (1 475–1 980 K) present a grain orientation that is mainly defined by initial grain orientation of the titanium substrate. Coarsening pretreatments on the titanium samples before nitriding allows the synthesis of a strongly oriented TiN layer. The TiN + α‐Ti layer thickness reaches about 116 µm after a 1 h treatment at 1 760 K. For these treat… Show more
“…Gas-phase nucleation of nanomaterials in a microplasma from vapour precursors (e.g. figure 3) is a natural extension of previous studies with low-pressure plasmas [10] and largerscale atmospheric plasmas and jets [40,41]. There are many different precursors that are available, generally referred to as chemical vapour deposition (CVD) or metal-organic chemical vapour deposition (MOCVD) precursors, that can be nonthermally dissociated in a microplasma to grow different types of materials (i.e.…”
Section: Gas-phase Synthesismentioning
confidence: 59%
“…Finally, the particles will exit the plasma volume as an aerosol flow. This approach has been successfully used to synthesize carbon nanomaterials [42][43][44][45], silicon nanoparticles [37][38][39][40][41][42][43][44][45][46][47] and metal nanoparticles [48,49]. Compared with low-pressure plasma experiments (e.g.…”
Low-pressure, low-temperature plasmas are widely used for materials applications in industries ranging from electronics to medicine. To avoid the high costs associated with vacuum equipment, there has always been a strong motivation to operate plasmas at higher pressures, up to atmospheric. However, high-pressure operation of plasmas often leads to instabilities and gas heating, conditions that are unsuitable for materials applications. The recent development of microscale plasmas (i.e. microplasmas) has helped realize the sustainment of stable, non-thermal plasmas at atmospheric pressure and enable low-cost materials applications. There has also been an unexpected benefit of atmospheric-pressure operation: the potential to fabricate nanoscale materials which is not possible by more conventional, low-pressure plasmas. For example, in a high-pressure environment, nanoparticles can be nucleated in the gas phase from vapour (or solid metal) precursors. Alternatively, non-thermal, atmospheric-pressure plasmas can be coupled with liquids such as water or ethanol to nucleate and modify solution-phase nanoparticles. In this perspective paper, we review some of these recent efforts and provide an outlook for the rapidly emerging field of atmospheric-pressure plasmas for nanofabrication.
“…Gas-phase nucleation of nanomaterials in a microplasma from vapour precursors (e.g. figure 3) is a natural extension of previous studies with low-pressure plasmas [10] and largerscale atmospheric plasmas and jets [40,41]. There are many different precursors that are available, generally referred to as chemical vapour deposition (CVD) or metal-organic chemical vapour deposition (MOCVD) precursors, that can be nonthermally dissociated in a microplasma to grow different types of materials (i.e.…”
Section: Gas-phase Synthesismentioning
confidence: 59%
“…Finally, the particles will exit the plasma volume as an aerosol flow. This approach has been successfully used to synthesize carbon nanomaterials [42][43][44][45], silicon nanoparticles [37][38][39][40][41][42][43][44][45][46][47] and metal nanoparticles [48,49]. Compared with low-pressure plasma experiments (e.g.…”
Low-pressure, low-temperature plasmas are widely used for materials applications in industries ranging from electronics to medicine. To avoid the high costs associated with vacuum equipment, there has always been a strong motivation to operate plasmas at higher pressures, up to atmospheric. However, high-pressure operation of plasmas often leads to instabilities and gas heating, conditions that are unsuitable for materials applications. The recent development of microscale plasmas (i.e. microplasmas) has helped realize the sustainment of stable, non-thermal plasmas at atmospheric pressure and enable low-cost materials applications. There has also been an unexpected benefit of atmospheric-pressure operation: the potential to fabricate nanoscale materials which is not possible by more conventional, low-pressure plasmas. For example, in a high-pressure environment, nanoparticles can be nucleated in the gas phase from vapour (or solid metal) precursors. Alternatively, non-thermal, atmospheric-pressure plasmas can be coupled with liquids such as water or ethanol to nucleate and modify solution-phase nanoparticles. In this perspective paper, we review some of these recent efforts and provide an outlook for the rapidly emerging field of atmospheric-pressure plasmas for nanofabrication.
“…Microwave nonequilibrium plasmas at atmospheric pressure have specific characteristics; for example, the temperature of the gas can be easily controlled, reaching high values (>3000 • C). This thermal energy can be employed in materials treatment, together with active species generated in the plasma, and it has already been applied to the nitriding of titanium [22]. In this paper, a novel microwave plasma source was designed, allowing simultaneous or step-wise microwave plasma oxidation and carburizing, which was applied to Grade 37 titanium.…”
Grade 37 titanium is widely used in racing applications thanks to its oxidation resistance up to 650 °C, but it suffers from poor wear and fretting resistance, especially at high temperature. In this paper, different surface modification techniques, namely, carburizing, coating by PVD-ZrO2 and a novel microwave plasma oxy-carburizing treatment, are investigated in terms of hardness, wear resistance and scratch hardness, compared to the untreated substrate. Numerical simulation allowed optimization of the design of the microwave plasma source, which operated at 2.45 GHz at atmospheric pressure. The proposed microwave plasma oxy-carburizing treatment is localized and can serve to improve the tribological properties of selected regions of the sample; compared to untreated Grade 37 titanium, the oxy-carburized layer presents a decrease in the wear rate at 450 °C against alumina of 54% and an increase in scratch hardness of more than three times.
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