Surface and Coatings Technology
 1998
DOI: 10.1016/s0257-8972(98)00404-6
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Titanium ion implantation into silicon substrate by plasma-based metal ion implantation system with 100-kV/2.5-A pulse modulator

Ken Yukimura
1
,
Kazuto Ohno
2
,
Masao Koto
3
et al.
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Cited by 9 publications
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References 10 publications
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Metal plasma source for PBII using arc-like discharge with hot cathode

Chayahara
1
,
Mokuno
2
,
Kinomura
3
et al. 2004
Surface and Coatings Technology
5
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1
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Metal plasma source for PBII using arc-like discharge with hot cathode

Chayahara
1
,
Mokuno
2
,
Kinomura
3
et al. 2004
Surface and Coatings Technology
5
0
1
0
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The effect of plasma density on the deposition and ion implantation to the materials with three-dimensional topologies in metal d.c. plasma-based ion implantation

Yukimura
1
,
Sano
2
,
Teramoto
3
et al. 2000
Surface and Coatings Technology
7
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Plasma-based ion implantation and its application to three-dimensional materials

Yukimura
1
2001
Surface and Coatings Technology
10
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2
0
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