Titania‐Coated Platinum Thin Films by MOCVD: Electrochemical and Photoelectrochemical Properties

Daniele, Salvatore; Battistel, Dario; Gerbasi, R.; Benetollo, Franco; Battiston, Simone

doi:10.1002/cvde.200706599

Cited by 9 publications

(5 citation statements)

References 47 publications

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“…A mean reactor temperature of 400°C was chosen on the basis of the promising results described in previous papers. [12][13][14][15] The film thickness was determined by using a KLA Tencor Alpha-Step IQ surface profilometer to analyze the step height of the films on partially masked samples; the mask created a step between the film and the substrate, and this step permitted us to evaluate the film thickness.…”

Section: Methodsmentioning

confidence: 99%

Photocatalytic Activity Dependence on the Structural Orientation of MOCVD TiO[sub 2] Anatase Films

Gerbasi

Bolzan

Habra

et al. 2009

J. Electrochem. Soc.

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This paper is concerned with the study of metallorganic chemical vapor deposition (MOCVD) anatase film growth, with the aim of assessing the relationship between the TiO2 surface morphology and the photocatalytic properties of the films, particularly their relation to the decomposition of ethylbenzene at 50μgnormalm−3 in humidified air. We have found an interesting relationship between the structural properties of TiO2 films deposited by MOCVD at 400°C for different deposition times. We observed the maximum efficiency of films in the thickness range of 600–900 nm, while in a higher thickness, this activity relentlessly decreased. From atomic force microscopy analysis, it was ascertained that this reduction was not due to a decrease in the superficial area, which showed a constant roughness of films thicker than 600 nm. From X-ray diffraction analysis, the films always grew in the anatase TiO2 structure, but the thicker the films, the more pronounced the (100) preferred orientation. Thanks also to theoretical considerations, it was concluded that the activity decrease in the 900–1800 nm thickness range was due to the particularly strong increase in the (100) plane-oriented crystallites recorded in the same range, causing a decrease in surface energy and, contemporaneously, a hindering effect on photocatalytic activity.

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Section: Methodsmentioning

confidence: 99%

Photocatalytic Activity Dependence on the Structural Orientation of MOCVD TiO[sub 2] Anatase Films

Gerbasi

Bolzan

Habra

et al. 2009

J. Electrochem. Soc.

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“…The precursor was kept at 50°C, and the reactor temperature, monitored by three thermocouples placed in three different fixed positions (about 10, 20, 30 cm from the tube entrance), was kept at 380°C, 390°C and 410°C respectively, so that the precursor consumption along the reactor tube was balanced by a corresponding temperature increase, giving rise to a fairly constant film growth along the horizontal dimension of the reactor. A mean reactor temperature of 400°C was chosen on the basis of the promising results described in previous papers (12)(13)(14)(15).…”

Section: Experimental Methodsmentioning

confidence: 99%

Photocatalytic Activity Dependence on the Structural Orientation of MOCVD TiO₂ Anatase Films

Gerbasi¹,

Bolzan²,

Habra³

et al. 2009

ECS Trans.

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This paper is concerned with the study of MOCVD anatase film growth with the aim of assessing the link between the TiO2 surface morphology and the photocatalytic properties of the films, in particular related to the decomposition of organic contamination in the atmosphere. We have found a relationship between the structural properties of TiO2 films deposited by MOCVD at 400{degree sign}C for differing deposition times, and the corresponding photocatalytic activity which resulted to be different several times depending on the film thickness. The photocatalytic activity measurements were carried out using ethylbenzene at 50 µg m-3 in humidified air.

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“…Nowadays, platinum(II) acetylacetonate, Pt(acac) 2 , is the most demanded MOCVD precursor used for the deposition of platinum nanomaterials for various purposes, including catalysis [107], microelectrodes [108,109], and microelectronic [110] applications. Its relevance is related to its ability to change the morphology of Pt films deposited from Pt(acac) 2 in a wide range depending on MOCVD parameters.…”

Section: Application Of Platinum Precursors In Mocvd Processesmentioning

confidence: 99%

Volatile Iridium and Platinum MOCVD Precursors: Chemistry, Thermal Properties, Materials and Prospects for Their Application in Medicine

et al. 2021

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Interest in iridium and platinum has been steadily encouraged due to such unique properties as exceptional chemical inertia and corrosion resistance, high biological compatibility, and mechanical strength, which are the basis for their application in medical practice. Metal-organic chemical vapor deposition (MOCVD) is a promising method to fabricate Ir and Pt nanomaterials, multilayers, and heterostructures. Its advantages include precise control of the material composition and microstructure in deposition processes at relatively low temperatures onto non-planar substrates. The development of MOCVD processes is inextricably linked with the development of the chemistry of volatile precursors, viz., specially designed coordination and organometallic compounds. This review describes the synthesis methods of various iridium and platinum precursors, their thermal properties, and examples of the use of MOCVD, including formation of films for medical application and bimetallics. Although metal acetylacetonates are currently the most widely used precursors, the recently developed heteroligand Ir(I) and Pt(IV) complexes appear to be more promising in both synthetic and thermochemical aspects. Their main advantage is their ability to control thermal properties by modifying several types of ligands, making them tunable to deposit films onto different types of materials and to select a combination of compatible compounds for obtaining the bimetallic materials.

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Titania‐Coated Platinum Thin Films by MOCVD: Electrochemical and Photoelectrochemical Properties

Cited by 9 publications

References 47 publications

Photocatalytic Activity Dependence on the Structural Orientation of MOCVD TiO[sub 2] Anatase Films

Photocatalytic Activity Dependence on the Structural Orientation of MOCVD TiO[sub 2] Anatase Films

Photocatalytic Activity Dependence on the Structural Orientation of MOCVD TiO₂ Anatase Films

Volatile Iridium and Platinum MOCVD Precursors: Chemistry, Thermal Properties, Materials and Prospects for Their Application in Medicine

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Titania‐Coated Platinum Thin Films by MOCVD: Electrochemical and Photoelectrochemical Properties

Cited by 9 publications

References 47 publications

Photocatalytic Activity Dependence on the Structural Orientation of MOCVD TiO[sub 2] Anatase Films

Photocatalytic Activity Dependence on the Structural Orientation of MOCVD TiO[sub 2] Anatase Films

Photocatalytic Activity Dependence on the Structural Orientation of MOCVD TiO2 Anatase Films

Volatile Iridium and Platinum MOCVD Precursors: Chemistry, Thermal Properties, Materials and Prospects for Their Application in Medicine

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Photocatalytic Activity Dependence on the Structural Orientation of MOCVD TiO₂ Anatase Films