Photocatalytic Activity Dependence on the Structural Orientation of MOCVD TiO₂ Anatase Films

Abstract

This paper is concerned with the study of MOCVD anatase film growth with the aim of assessing the link between the TiO2 surface morphology and the photocatalytic properties of the films, in particular related to the decomposition of organic contamination in the atmosphere. We have found a relationship between the structural properties of TiO2 films deposited by MOCVD at 400{degree sign}C for differing deposition times, and the corresponding photocatalytic activity which resulted to be different several times depending on the film thickness. The photocatalytic activity measurements were carried out using ethylbenzene at 50 µg m-3 in humidified air.

A new supported TiO 2 film deposited on stainless steel for the photocatalytic degradation of contaminants of emerging concern

“…Titanium tetra-isopropoxide [Ti(O i Pr)4] (TTIP, 97%, where -O i Pr means -OCH(CH3)2) from Sigma-Aldrich was used as the precursor (without further purification). MOCVD experiments were carried out in a horizontal hot-wall reactor heated at a mean temperature of 400°C, whose details and main operating parameters are reported elsewhere [37,38]. TiO2 films were deposited on stainless steel meshes (35 µm hole size) utilizing a 8x20 cm rectangular mesh substrate for each deposition.…”

“…Stainless steel meshes (holes of 35 µm diameter) were used as the substrate, utilizing a 8x20 cm rectangular mesh sample for each deposition. During the MOCVD process the deposition time is proportional to the thickness of the deposited film; a deposition time of 4500 s was chosen with the aim of obtaining a corresponding TiO2 film thickness of about 1500 nm and the appropriate surficial characteristics in terms of crystallite size and roughness [37].…”