TiOx Films Deposited by Plasma Enhanced Chemical Vapour Deposition Method in Atmospheric Dielectric Barrier Discharge Plasma

A microplasma printer is employed to deposit thin film patterns of TiO2 by titanium tetra‐isopropoxide and N2/O2 plasma at atmospheric pressure. The setup is adopted to carry out deposition in two configurations, namely under chemical vapor deposition (CVD) and atomic layer deposition (ALD) modes. The properties of TiO2, as well as the patterning resolution, are investigated. The amorphous TiO2 deposited in the CVD mode contains a relatively high level of impurities (residual carbon content of 5–10 at.%) and is characterized by a low refractive index of 1.8. With the ALD mode on the other hand, TiO2 is obtained with a low level of impurities (<1 at.% C and <2 at.% N), a refractive index of 1.98, and a growth per cycle of 0.15 nm. Furthermore, the spatial resolution for a 8‐nm‐thick film is determined by X‐ray photoelectron spectroscopy line scan and found to be equal to 2,000 and 900 µm for the CVD and ALD modes, respectively. This study can be regarded as the first step toward area‐selective CVD and ALD of TiO2 by a microplasma printer, which can be further explored and extended to other material systems.

Section: Resultsmentioning

confidence: 98%

Section: Thin Film Characterizationmentioning

confidence: 99%

TiO₂ thin film patterns prepared by chemical vapor deposition and atomic layer deposition using an atmospheric pressure microplasma printer

Aghaee

Verheyen

Stevens³

et al. 2019

“…Dielectric barrier discharges (DBD) have become an attractive tool to achieve high‐quality plasma deposition of dense films at atmospheric pressure using liquid precursors like HMDSO (hexamethyldisiloxane) to produce SiO 2 like coatings or TTIP (titanium tetraisopropoxide) for TiO 2 ‐like coatings . Reactive gases like SiH 4 and NH 3 can also be used to create Si‐N x H .…”

Section: Introductionmentioning

confidence: 99%

“…Dielectric barrier discharges (DBD) have become an attractive tool to achieve high-quality plasma deposition of dense films at atmospheric pressure using liquid precursors like HMDSO (hexamethyldisiloxane) to produce SiO 2 like coatings [1,2] or TTIP (titanium tetraisopropoxide) for TiO 2 -like coatings. [3] Reactive gases like SiH 4 and NH 3 can also be used to create Si-N x H. [4] The next issue for the deposition of multifunctional nanocomposites is to insert nanoparticles (NPs) into the matrix. Nanocomposites (NC) consist in a matrix in which particles of a few hundred nanometers of size are included.…”

Section: Introductionmentioning

confidence: 99%

Deposition of homogeneous carbon‐TiO₂ composites by atmospheric pressure DBD

Brunet

Rincón

Margot

et al. 2016

Atmospheric pressure Dielectric Barrier Discharge (AP‐DBD) was used to deposit homogeneous carbon‐TiO2 composites. Non‐intrusive Laser Light Scattering was employed to study the transport of the nanoparticles across the plasma. The characteristics of the coating were found to depend on the gas flow and on the spray chamber used for introducing the nanoparticles (cyclonic and Scott spray chambers). According to the SEM images, higher gas flows favor the formation of more homogeneous coatings both in terms of thickness and NPs‐aggregates distribution regardless of the spray chamber. The Scott spray chamber was shown to be more efficient for the deposition of uniform coatings even at low gas flows. It also yields the highest Ti concentration that reaches up to 18%. Furthermore, the light scattered by the nanoparticles was shown to be directly related to the coating thickness, hence to the density of nanoparticles in the plasma.

“…However, only the possibility to fabricate TiO 2 coatings by this method was demonstrated. A more detailed research was presented by Liu and Lai, Klenko and Pichal, and Bai with co‐workers who prepared crystalline TiO 2 nanoparticles by atmospheric pressure plasma in the TTIP/H 2 O + N 2 /O 2 /Ar mixtures with subsequent annealing. It was shown that different types of N‐doping of TiO 2 were realized depending on the working gas and/or annealing gas composition.…”

Section: Introductionmentioning

confidence: 99%

Nitrogen‐Doped TiO₂ Nanoparticles and Their Composites with Plasma Polymer as Deposited by Atmospheric Pressure DBD

Shelemin

Choukourov

Kousal

et al. 2014

TiO2 nanoparticles and nitrogen‐doped TiO2−xNx nanoparticles dispersed in plasma polymer phase are produced by atmospheric pressure DBD in titanium tetraisopropoxide with dry air, mixture of N2 and O2, and 100% N2 used as carrier gases. Energy supply per monomer molecule (the Yasuda parameter) is found to be an important parameter describing the deposition process in N2. In the monomer deficient regime, spherical TiO2 particles are produced with an average size varying from 30 to 80 nm. In the power deficient regime, composite films are deposited consisting of TiO2−xNx nanoparticles embedded in nitrogen‐rich plasma polymer matrix, particulates being larger than 100 nm.