TiO2-SiO2 mixed oxide deposited by low pressure PECVD: Insights on optical and nanoscale electrical properties

Comparison of TiₓSi1-x O2 mixed oxide and TiO₂ in SiO₂ nanocomposite dielectric properties at nanoscale

“…To investigate the chemical composition of the TiO2 in SiO2 NC and of the TixSi1-xO2 MO thin films, at the very surface, XPS measurements were carried out. Concerning MO, the results confirm that we manage to elaborated TixSi1-xO2 films with a Ti atomic percentage of 0%, 33%, 49% and 54 % which correspond to x = 0, 0.33, 0.49 and 0.54 respectively [6]. Concerning NC, XPS results are reported in Table I and compare to those provided by the SE and the BEMA model concerning the volume fraction of TiO2 NPs [12].…”

“…In addition, in both cases, the films and NC growth was monitored with in situ ellipsometry with real-time fitting, allowing to stop deposition when the targeted thickness (50 nm) was reached. Thickness values were obtained thanks to a robust fitting model, fully validated for higher thicknesses [6]. We are thus confident that the targeted thicknesses were achieved.…”

“…The variation of the TTIP and HMDSO flow rate was used to vary the Ti content in the deposited TiO2-SiO2 mixed oxide films. By this way, we intended to elaborate TixSi1-xO2 MO films with x = 0, 0.33, 0.49 and 0.54 [6]. The synthesis of TiO2 in SiO2 NC (50 nm thick) is based on the injection of a colloidal TiO2 NPs solution in the PECVD reactor described above.…”

“…In this context, mixed oxides (MO) such as TixSi1-xO2 appear attractive to take advantage of both SiO2 low leakage current and of TiO2 high εr. However, the εr increasing remains limited [6]. Another way of improvement deals with nanocomposite (NC) materials.…”

Nanoscale dielectric properties of TiO2 in SiO2 nanocomposite deposited by hybrid PECVD method

“…To avoid this behavior, mixed oxides such as Ti x Si 1-x O 2 have been developed. However, Ti x Si 1-x O 2 films which exhibit low leakage current do not offer enough increase of their dielectric permittivity increase [8]. In a second approach, high-k multilayers stacking or nanolaminates were investigated since they lead to a reduction in leakage current and an increase in ε r which depends on the number of layers [1].…”