2014
DOI: 10.1063/1.4867043
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Time-resolved photoluminescence from defects in n-type GaN

Abstract: Point defects in GaN were studied with time-resolved photoluminescence (PL). The effects of temperature and excitation intensity on defect-related PL have been investigated theoretically and experimentally. A phenomenological model, based on rate equations, explains the dependence of the PL intensity on excitation intensity, as well as the PL lifetime and its temperature dependence. We demonstrate that time-resolved PL measurements can be used to find the concentrations of free electrons and acceptors contribu… Show more

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Cited by 40 publications
(40 citation statements)
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References 36 publications
(76 reference statements)
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“…The quenching is caused by the thermal emission of holes from the shallow acceptor to the valence band. The PL lifetime decreases very similarly to the PL intensity, in agreement with theory (Reshchikov, 2014a).…”
Section: Uvl (327 Ev) Bandsupporting
confidence: 83%
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“…The quenching is caused by the thermal emission of holes from the shallow acceptor to the valence band. The PL lifetime decreases very similarly to the PL intensity, in agreement with theory (Reshchikov, 2014a).…”
Section: Uvl (327 Ev) Bandsupporting
confidence: 83%
“…(6) in conductive n-type GaN. Then, the concentration of free electrons can be found if the electron-capture coefficient C nA is known (Reshchikov, 2014a). At temperatures above 100 K, the UVL band is quenched with an activation energy of about 180 meV.…”
Section: Uvl (327 Ev) Bandmentioning
confidence: 99%
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“…6. The dependences are very similar to each other and can be fit with the following expressions [14] …”
Section: Effect Of Temperaturementioning
confidence: 99%
“…The concentration of free electrons, n, given in Table I for these two samples, is calculated from the PL lifetime of the YL band at room temperature, according to a model presented in Ref. [14], while the direct Hall effect measurements showed an apparent concentration of about three times higher due to the existence of a highly conductive layer near the GaN/sapphire interface [15].…”
Section: A Experimental Detailsmentioning
confidence: 99%