Time-resolved measurements of highly polymerized negative ions in radio frequency silane plasma deposition experiments

Abstract

Articles you may be interested inTime-resolved measurements of ion energy distributions in dual-mode pulsed-microwave/radio frequency plasma Time-resolved measurements of ion energy distributions and optical emissions in pulsed radio-frequency discharges Negative ion mass spectra and particulate formation in radio frequency silane plasma deposition experiments Appl.

Negative ion chemistry in Titan's upper atmosphere

“…Based on ions growth rate in silane discharges (Howling et al, 1994;Perrin et al, 1994), the rate coefficient for these reactions is set to 10 -12 cm 3 s -1 .…”

Controlled dust formation in pulsed rf plasmas

“…Previous works show a clear correlation between the pulse frequency and the appearance of dust. 31,32 We will focus in this article on the influence of the pulse frequency on the dust formation in a capacitively coupled rf discharge operated in a mixture of argon and acetylene. The experimental results will be discussed by means of a simple model that deals with the formation of negative ions in a pulsed discharge.…”

Phase Controlled Class E Amplifier Characteristics for Pulsing Applications

“…This can be achieved using square-wave pulses with periods from 10 to 100 μs [10]- [12]. Furthermore, it has been seen that quality of the deposited thin films is improved and dust particles in the plasma chamber is reduced with the application of RF signal when it is presented in the form of PWM signal instead of continuous signal [13], [14]. The demand to improve the process quality in semiconductor fabrication led to the design and implementation of amplifiers with high-power pulsing capability.…”