Time-resolved ion energy distribution in pulsed inductively coupled argon plasma with/without DC bias

Chen, Zhiying; Blakeney, Joel; Carruth, Megan; Ventzek, Peter L. G.; Ranjan, Alok

doi:10.1116/6.0001737

Cited by 6 publications

(3 citation statements)

References 25 publications

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“…An equivalent circuit model was developed to explain the operation of this source including the dynamical charging of the dielectric wafer [23]. Additional experiments confirmed the operation details by measuring the time resolved flux-energy distribution of the impacting ions [24]. Recent studies target the homogeneity over large area surfaces of both the total flux and the angular distribution of the impacting ions [25].…”

Section: Introductionmentioning

confidence: 95%

Control of ion flux-energy distribution at dielectric wafer surfaces by low frequency tailored voltage waveforms in capacitively coupled plasmas

Hartmann

Korolov

Escandón-López

et al. 2023

J. Phys. D: Appl. Phys.

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Capacitively coupled plasmas are routinely used in an increasing number of technological applications, where a precise control of the flux and energy distribution of ions impacting boundary surfaces is required. In the presence of dielectric wafers and targets the accumulation of charges on these surfaces can significantly alter the time evolution of the sheath electric field that is accountable for ion acceleration from the plasma bulk to the surfaces and, thus, lead to parasitic distortions of process relevant ion flux-energy distributions. We apply PIC/MCC simulations to provide insights into the operation, ion acceleration mechanisms, and the formation of such distributions at dielectric wafers for discharges in argon gas. The discharges are driven by a combination of a single high frequency (27.1~MHz) voltage signal and a low frequency (100~kHz) customized pulsed voltage waveform. The low frequency waveform includes a base square signal to realize narrow and controllable high energy peaks of the ion distribution, and steady-slope ramp voltage components. We discuss the distorting effect of dielectric surface charging on the ion flux-energy distribution and provide details about how the voltage ramps can restore its narrow peaked shape. The dependence of the surface charging properties on the low frequency pulse duty cycle and amplitude, as well as the high frequency voltage amplitude is revealed. The radial homogeneity of the ion flux is found to be maintained within ± 10 % around the mean value for all quantities investigated. The radial electric field developing at the edge of the dielectric wafer with finite width has only a small influence on the overall homogeneity of the plasma across the whole surface, its effect remains localised to the outermost few mm-s of the wafer.

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Section: Introductionmentioning

confidence: 95%

Control of ion flux-energy distribution at dielectric wafer surfaces by low frequency tailored voltage waveforms in capacitively coupled plasmas

Hartmann

Korolov

Escandón-López

et al. 2023

J. Phys. D: Appl. Phys.

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“…140) During transitions of plasma in a pulsed period from a plasma ignition stage to a stable glow stage and to an afterglow period, the ion energy and ion flux were tailored by pulsing waveforms. 141) 2.7.2. Measurement of transport in the interior of HAR features.…”

Section: 5mentioning

confidence: 99%

Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies

Kambara

Kawaguchi

Lee

et al. 2022

Jpn. J. Appl. Phys.

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Low-temperature plasma processing technologies is essential for material synthesis, device fabrication, and surface treatment. The development of plasma-related products and services requires an understanding of the multiscale complex behaviors of plasma and the hierarchical integration of plasma generation, energy and mass transports through sheath region, surface reactions, and other processes. The importance of science-based and data-driven approaches to controlling systems is argued. The state-of-the-art of deep learning, machine learning, and artificial intelligence in low-temperature plasma science and technology is reviewed. In this review, the requirements and challenges for plasma parameter prediction and processing recipe discovery are asserted by researchers in the fields of material science and plasma processing. It also outlined a science-based, data-driven approach for development of virtual metrology in plasma processes.

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“…When the plasma power is turned off, electrons and ions do not immediately recombine, but instead gradually diminish in number, in what is called a temporal afterglow [34][35][36][37][38][39][40]. The ions and electrons are transported to the chamber walls, during the afterglow, and the timing of this transport has been a topic of renewed interest because of dust particle charging [8,[11][12][13].…”

Section: Introductionmentioning

confidence: 99%

Controlling the charge of dust particles in a plasma afterglow by timed switching of an electrode voltage

Chaubey

Goree

2023

J. Phys. D: Appl. Phys.

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A method is demonstrated for controlling the charge of a dust particle in a plasma afterglow, allowing a wider range of outcomes than an earlier method. As in the earlier method, the dust particles are located near an electrode that has a DC voltage during the afterglow. Here, that DC voltage is switched to a positive value at a speciﬁed delay time, instead of maintaining a constant negative voltage as in the earlier method. Adjusting the timing of this switching allows one to control the residual charge gradually over a wide range that includes both negative and positive values of charge. For comparison, only positive residual charges were attained in the earlier method. We were able to adjust the residual charge from about -2000 e to +10,000 e, for our experimental parameters (8.35 mm particles, 8 mTorr argon pressure, and a DC voltage that was switched from -150 V to +125 V within the ﬁrst two milliseconds of the afterglow). The plasma conditions near the dust particles changed from ion-rich to electron-rich, when the electrode was switched from cathodic to anodic. Making this change at a speciﬁed time, as the electrons and ions decay in the afterglow, provides this control capability. These results also give insight into the time development of a dust particle’s charge in the afterglow, on a sub-millisecond time scale.

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Time-resolved ion energy distribution in pulsed inductively coupled argon plasma with/without DC bias

Cited by 6 publications

References 25 publications

Control of ion flux-energy distribution at dielectric wafer surfaces by low frequency tailored voltage waveforms in capacitively coupled plasmas

Control of ion flux-energy distribution at dielectric wafer surfaces by low frequency tailored voltage waveforms in capacitively coupled plasmas

Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies

Controlling the charge of dust particles in a plasma afterglow by timed switching of an electrode voltage

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