Three-dimensional simulation of an inductively coupled plasma reactor

A two-dimensional self-consistent simulation of a miniaturized inductively coupled plasma (mICP) reactor was developed. The coupled equations for plasma power deposition, electron temperature, and charged and neutral species densities, were solved to obtain the spatial distribution of an argon discharge. The effect of control parameters, such as power and pressure, on the evolution of plasma density and electron temperature was investigated. Strong ion density gradients were observed which can make spatially resolved Langmuir probe measurements particularly challenging. Simulation results were in reasonable agreement with available experimental data. The neutral gas temperature was predicted to be close to the wall temperature, due to the small length scale of the mICP, allowing for efficient heat transfer.

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“…12 A circuit model is then implemented to account for this effect, as outlined in Ref. 13. The power deposited in the plasma was computed by…”

Section: A Electromagneticsmentioning

confidence: 99%

Two-dimensional simulation of a miniaturized inductively coupled plasma reactor

Nam

Economou

2004

Journal of Applied Physics

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“…1. Based on the insights gained from previous detailed simulations and experimental studies of this type of reactor, several simplifying assumptions were introduced in order to capture the discharge behavior with only a few dimensionless numbers [21], [26].…”

Section: A Model Assumptions and Equationsmentioning

confidence: 99%

“…Third, the space charge field is obtained from (5) assuming Boltzmann electrons, where is electron temperature, is Boltzmann constant, and is the elementary charge [26], [30].…”

Section: A Model Assumptions and Equationsmentioning

confidence: 99%

Experimental and theoretical study of two-dimensional ion flux uniformity at the wafer plane in inductively coupled plasmas

Kim

Aydil

2003

IEEE Trans. Plasma Sci.

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A two-dimensional array of planar Langmuir probes manufactured on a 200-mm-diameter silicon wafer was used to measure the spatial distribution of ion flux impinging on the wafer surface in various discharges of electropositive (Ar) and electronegative (SF 6 and Cl 2 ) gases maintained in an inductively coupled plasma etching reactor with a planar spiral coil. In conjunction with the experiments, a two-dimensional fluid model of the plasma was developed to capture the dependence of the ion flux uniformity on plasma operating parameters and reactor geometry through a set of dimensionless numbers which are the ratios of various time and length scales intrinsic to the discharge. These dimensionless ratios include reactor dimensions, the skin depth, the electron energy relaxation length, ion diffusion length, and ionization and attachment rates. The model provides a simple framework within which the spatial variation of ion flux in inductively coupled plasmas can be understood. The approach captures the dependence of ion flux uniformity on plasma operating variables such as pressure and feed gas composition.Index Terms-Chlorine plasma, discharge modeling, electronegative discharge, inductively coupled plasma, ion flux probe, langmuir probe, plasma etching, plasma uniformity, sulfur hexafluoride plasma.

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“…Using COMSOL software platform, this study provides evidence confirming the validity of our two-dimensional plasma fluid model. [8][9][10][11] We begin this process of comparison of this model simulations and measurement in relatively simple discharge chemistries in this paper, namely, argon (Ar).…”

Section: Introductionmentioning

confidence: 99%

Simulation of a large size inductively coupled plasma generator and comparison with experimental data

Lei,

Li,

Liu

et al. 2018

AIP Advances

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A two-dimensional axisymmetric inductively coupled plasma (ICP) model with its implementation in the COMSOL (Multi-physics simulation software) platform is described. Specifically, a large size ICP generator filled with argon is simulated in this study. Distributions of the number density and temperature of electrons are obtained for various input power and pressure settings and compared. In addition, the electron trajectory distribution is obtained in simulation. Finally, using experimental data, the results from simulations are compared to assess the veracity of the two-dimensional fluid model. The purpose of this comparison is to validate the veracity of the simulation model. An approximate agreement was found (variation tendency is the same). The main reasons for the numerical magnitude discrepancies are the assumption of a Maxwellian distribution and a Druyvesteyn distribution for the electron energy and the lack of cross sections of collision frequencies and reaction rates for argon plasma.

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Three-dimensional simulation of an inductively coupled plasma reactor

Cited by 54 publications

References 16 publications

Two-dimensional simulation of a miniaturized inductively coupled plasma reactor

Two-dimensional simulation of a miniaturized inductively coupled plasma reactor

Experimental and theoretical study of two-dimensional ion flux uniformity at the wafer plane in inductively coupled plasmas

Simulation of a large size inductively coupled plasma generator and comparison with experimental data

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