2003
DOI: 10.1063/1.1604468
|View full text |Cite
|
Sign up to set email alerts
|

Three-dimensional nanolithography using proton beam writing

Abstract: We report the utilization of a focused mega-electron-volt (MeV) proton beam to write accurate high-aspect-ratio structures at sub-100 nm dimensions. Typically, a MeV proton beam is focused to a sub-100 nm spot size and scanned over a suitable resist material. When the proton beam interacts with matter it follows an almost straight path. The secondary electrons induced by the primary proton beam have low energy and therefore limited range, resulting in minimal proximity effects. These features enable smooth thr… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
93
0

Year Published

2005
2005
2015
2015

Publication Types

Select...
6
2

Relationship

1
7

Authors

Journals

citations
Cited by 152 publications
(93 citation statements)
references
References 10 publications
0
93
0
Order By: Relevance
“…The nanofluidic device was made by replication in PDMS of a patterned master stamp (13). The stamp was fabricated in hydrogen silsesquioxane (HSQ) resist (Dow Corning) using a lithography processes with proton beam writing (17,18). The 300 nm height of the positive channel structures on the stamp was measured with atomic force microscopy (Dimension 3000, Veeco).…”
Section: Experimental Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The nanofluidic device was made by replication in PDMS of a patterned master stamp (13). The stamp was fabricated in hydrogen silsesquioxane (HSQ) resist (Dow Corning) using a lithography processes with proton beam writing (17,18). The 300 nm height of the positive channel structures on the stamp was measured with atomic force microscopy (Dimension 3000, Veeco).…”
Section: Experimental Methodsmentioning
confidence: 99%
“…Our experiments are done using nanofluidic devices made of poly-(dimethyl siloxane) (PDMS). We have used a lithography process with proton beam writing to fabricate a nanopatterned stamp (17,18). The stamp was subsequently replicated in PDMS, followed by curing and sealing with a glass slide (19).…”
mentioning
confidence: 99%
“…The stamp was fabricated in HSQ resist (Dow Corning, Midland, MI) using a lithography process with proton beam writing. 15,16 A scanning electron microscopy image of the HSQ stamp bearing the positive nanostructures is displayed in Fig. 3a.…”
Section: Experimental Procedures a Fabrication Of The Nanofluidmentioning
confidence: 99%
“…We have used a lithography process with proton beam writing to fabricate a nanopatterned stamp. 15,16 The stamp was subsequently replicated in poly(dimethyl siloxane) (PDMS) polymer, followed by curing and sealing with a glass slide. 17,18 In order to visualize the DNA molecules with fluorescence microscopy it is necessary to stain them with a dye.…”
Section: Introductionmentioning
confidence: 99%
“…22 The grid of nanochannels was made in HSQ resist (Dow Corning, Midland, MI) using a lithography process with proton beam writing. 23,24 The two intersecting arrays of nanochannels are connected to a superposing set of microchannels made in SU-8 resin with UV lithography. To promote the release of the PDMS replica, the stamp was coated with a layer of teflon with a thickness of 5 nm and baked at 393 K for 12 h. 25 As measured with scanning electron microscopy, the perpendicular nanochannels have widths of 150 ± 10 nm and 250 ± 10 nm, respectively.…”
Section: Chip Fabricationmentioning
confidence: 99%