Three-dimensional design in electron-beam lithography

Abstract

Articles you may be interested inThree-dimensional electron-beam lithography using an all-dry resist process Si nanostructures fabricated by electron beam lithography combined with image reversal process using electron cyclotron resonance plasma oxidation A technology for micro/nanostructuring of surfaces based on one-step direct electron-beam lithography, plasma-chemical etching, and electrochemical deposition is developed. The key operation for three-dimensional ͑3D͒ design is 3D dose correction. It allows one to create structures in organic resist on a substrate with a predefined profile with vertical sizes in the range of 50 nm-5 m and with 50-1 mm dimensions in the lateral direction. Metal replicas were created by electrochemical deposition. The replicas were used then as a stamp for fast transferring of the relief into a soft material ͑polymer͒. We expect the application of this process in optoelectronics, optical processing, creation of zone plates, and other diffractive optical elements ͑calculated holograms͒.

Fabrication of digital rainbow holograms and 3-D imaging using SEM based e-beam lithography

“…Resists which are usually used have a very high contrast and this leads to a very low tolerance of the production process to errors in the exposure dose, temperature, time of development, etc. The low tolerance was the reason why the grating modulation control was not even included as a standard function for color synthesis in the described approach although electron lithography uses 3D shaping for fabrication of kinoform diffractive optics and computer generated holograms [28,6].…”

“…These technologies were exploited for fabrication of various synthetic holograms (or diffractive optical elements, DOE) not only for the simple binary amplitude or binary phase holograms but including so-called kinoform DOE. Rather early electron beam lithography was suggested [6] and used for fabrication of (kinoform) DOE [7]. Digital holography methods were used for fabrication of the first X-ray hologram by means of electron beam lithography where thin Ni "islands" were used as phaseshifting layers [8].…”

High resolution beam profiling of X-ray free electron laser radiation by polymer imprint development

“…In this study, we demonstrate that we can access much higher dynamic ranges by developing the beam ablation imprints in organic solvents. The procedure is similar to grayscale lithography, which is a well-established method to produce continuous surface profiles with pre-defined depth in resist layers, such as PMMA [12][13][14][15]. Compared to the ablation-based approach, this reduces the intensity threshold remarkably and thereby enhances the dynamic range of the method by at least an order of magnitude.…”

Desenvolvimento de processo litográfico tri-dimensional para aplicação em microóptica integrada.

“…FIG. 2.14 -Perfil de estrutura com relevo binário e correção da distribuição de doses de exposição para uma absorção uniforme de doses pelo resiste [28].…”

“…Faz-se então, necessário corrigir os níveis de dose atribuídos a cada região do arquivo gráfico de exposição. O método de correção proposto por[27,28] e empregado pela versão atual do software utilizado neste trabalho tem como objetivo calcular a dose T(x,y) não uniforme de exposição que após o efeito de proximidade produza uma dose absorvida aproximadamente constante dentro da área de varredura de cada polígono no resiste, de forma a reduzir, seguido o processamento da amostra, o erro na direção z das estruturas que se quer obter.…”