Three-Component Photopolymers Based on Thermal Crosslinking and Acidolytic De-Crosslinking of Vinyl Ether Groups. Effects of Binder Polymers on Photopolymer Characteristics

Moon, Seong-Yun; Kamenosono, Koji; Kondo, S.; Umehara, Akira; Yamaoka, Tsuguo

doi:10.1021/cm00046a047

Cited by 27 publications

(20 citation statements)

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“…[7][8][9] Figure 1 shows insolubilization curves of poly (p-hydroxystyrene) (PHS) films containing TPS-3VE-Tf. The PHS film with 1 mol% of TPS-3VE-Tf begins to become insolubilized at a SB temperature of 150 C and shows an insolubilization The film with 6 mol% of TPS-Tf 3VE also began to insolubilize at 50 °C and showed nearly complete insolubilization at 90 °C .…”

Section: Resultsmentioning

confidence: 99%

Novel Deep UV Photoresist Based on Thermal Cross-Linking and De-Cross-Linking of Cross-Linkable Photoacid Generator.

Moon

Koo

et al. 1998

J. Photopol. Sci. Technol.

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We have synthesized a series of thermally cross-linkable photoacid generators. Among them, we used bis(4-(2-(vinyloxy)ethoxy)benzene)-4-methoxybenzene sulfonium triflate and tris(4-(2-(vinyloxy)ethoxy)benzene) sulfonium triflate for two or three component photopolymers, containing a phenolic binder polymer and a cross-linkable photoacid generator. On irradiation with deep UV, the photopolymer films had sensitivities of ca. 10 ti 20 mJ/cm2. The films, especially composed of polyp-hydroxystyrene-co-styrene), 2, 2-bis(4-(2-(vinyloxy)ethoxy)phenyl)propane, and a cross-linkable photoacid generator, showed the high resolution of 0.24 I.L m L/S under KrF excimer laser stepper (NA 0.45).

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Section: Resultsmentioning

confidence: 99%

Novel Deep UV Photoresist Based on Thermal Cross-Linking and De-Cross-Linking of Cross-Linkable Photoacid Generator.

Moon

Koo

et al. 1998

J. Photopol. Sci. Technol.

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“…It is well known that the polymer with a high Tg is difficult for large-scale molecular motion. [ 12] Because the cross-linking reaction leads to increase Tg of the base polymer, high density of cross-linking restrains the thermal cross-linking reaction of divinyloxyalkane with base polymer even more. Fig.…”

Section: Lithographic Evaluation Methodsmentioning

confidence: 99%

“…[ 11 ] Therefore, a high dissolution contrast between exposed and unexposed area, a high sensitivity and a good pattern profile were achieved in i-line lithography and synchrotron radiation (SR) based x-ray lithography. [12][13][14] …”

Section: Introductionmentioning

confidence: 99%

Divinyloxyalkane Cross-linker on DUV Photoresist.

Watanabe

Maeshima

Aoai

et al. 1998

J. Photopol. Sci. Technol.

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“…Yamaoka and co-workers have been studying cross-linking type positive working resist using vinyl ether cross-linker [5][6][7][8][9][10][11]. Thermal cross-linking reaction between polymer and vinyl ether cross-linker can make acetal bonding.…”

Section: Introductionmentioning

confidence: 99%