Thin reactive LiF films for nuclear sensors

Cosset, Françoise; Celerier, A.; Barelaud, Bruno; Vareille, Jean

doi:10.1016/s0040-6090(97)00070-9

Cited by 31 publications

(17 citation statements)

References 5 publications

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“…The change in the crystal size is considerable. The same phenomenon has previously been observed for evaporated LiF thin films, as well as other fluorides deposited by ALD 18, 25–28, 32, 33. In addition, it has been noted that the mean grain size in evaporated LiF films increases linearly with respect to film thickness at approx.…”

Section: Resultssupporting

confidence: 83%

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Atomic Layer Deposition of LiF Thin Films from Lithd and TiF₄ Precursors

Mäntymäki

Hämäläinen

Puukilainen

et al. 2013

Chemical Vapor Deposition

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ithium fluoride (LiF) is an important optical material with a low refractive index and a large band gap. In this study, thin films of LiF are deposited using atomic layer deposition (ALD). Lithd and TiF 4 are used as precursors, and they produce crystalline LiF in the temperature range 250-350 8C. The films are studied with UV-Vis spectrometry, field emission scanning electron microscopy (FESEM), X-ray diffraction (XRD), atomic force microscopy (AFM) and elastic recoil detection analysis (ERDA).Adhesion of the films is tested by a Scotch tape test. This ALD process results in LiF films with a growth rate of approximately 1 Å per cycle at 325 8C. According to ERDA measurements, the films are pure LiF with only small O, C, and H impurities.

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Section: Resultssupporting

confidence: 83%

“…Possibly the better adhesion is related to the smaller roughness of the film deposited at lower temperature. Evaporated 500 nm LiF films have been reported to adhere well to silicon substrates when the substrate temperature is kept above room temperature during the evaporation 32…”

Section: Resultsmentioning

confidence: 99%

Atomic Layer Deposition of LiF Thin Films from Lithd and TiF₄ Precursors

Mäntymäki

Hämäläinen

Puukilainen

et al. 2013

Chemical Vapor Deposition

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“…The LiF thin films were analysed by X-ray diffraction (XRD), with the results shown in In addition, this result confirms the suggestion [19] that the (200) plane has the lowest surface energy and is the most dense; therefore, the films grow along this crystalline direction once the energy is sufficiently high to allow for atom displacement at the surface.…”

supporting

confidence: 75%

A comparative study of optical and radiative characteristics of X-ray-induced luminescent defects in Ag-doped glass and LiF thin films and their applications in 2-D imaging

Kurobori

Miyamoto²,

Maruyama

et al. 2014

Nuclear Instruments and Methods in Physics Research Section B:

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We report novel disk-type X-ray two-dimensional (2-D) imaging detectors utilising Ag-doped phosphate glass and lithium fluoride (LiF) thin films based on the radiophotoluminescence (RPL) and photoluminescence (PL) phenomena, respectively. The accumulated X-ray doses written in the form of atomic-scale Ag-related luminescent centres in Ag-doped glass and F-aggregated centres in LiF thin films were rapidly reconstructed as a dose distribution using a homemade readout system. The 2-D images reconstructed from the RPL and PL detectors are compared with that from the optically stimulated luminescence (OSL) detector. In addition, the optical and dosimetric characteristics of LiF thin films are investigated and evaluated. The possibilities of dose distributions with a high spatial resolution on the order of microns over large areas, a wide dynamic range covering 11 orders of magnitude and a non-destructive readout are successfully demonstrated by combining the Ag-doped glass with LiF thin films. Toshio KUROBORI HIGHLIGHTSA novel disk-type Ag-doped glass and LiF thin film detectors based on the RPL and PL phenomena, respectively, were proposed.The capabilities of the 2-D dose images accumulated with a high spatial resolution and a wide dynamic range were demonstrated.The 2-D images reconstructed from the RPL and PL detectors were compared with that from the OSL detector. 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 Center, Chiyoda Technol Corporation, 3681 Narita-cho, Oarai-machi, Ibaraki 311-1313, Japan c Pulstec Industrial Corporation, 7000-35 Nakagawa, Hosoe-cho, Kita-ku, Hamamatsu-shi, Shizuoka, 431-1304 Research Highlights ABSTRACTWe report novel disk-type X-ray two-dimensional (2-D) imaging detectors utilising Ag-doped phosphate glass and lithium fluoride (LiF) thin films based on the radiophotoluminescence (RPL) and photoluminescence (PL) phenomena, respectively. The accumulated X-ray doses written in the form of atomic-scale Ag-related luminescent centres in Ag-doped glass and F-aggregated centres in LiF thin films were rapidly reconstructed as a dose distribution using a homemade readout system. The 2-D images reconstructed from the RPL and PL detectors are compared with that from the optically stimulated luminescence (OSL) detector. In addition, the optical and dosimetric characteristics of LiF thin films are investigated and evaluated. The possibilities of dose distributions with a high spatial resolution on the order of microns over large areas, a wide dynamic range covering 11 orders of magnitude and a non-destructive readout are successfully demonstrated by combining the Ag-doped glass with LiF thin films.

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“…However it was depending on temperature. The early stages of CaF 2 growth on Si (1 1 1) revealed well-ordered row like structures of hetero-epitaxial layers [43] and textured crystalline LiF film like structures were prepared on a mono-crystalline Si substrates [44]. In these experiments, Si was deposited on various fluoride crystals and it was found that the alkaline atoms strongly reacted with the Si (1 1 1) daggling bonds [45,46].…”

Section: Resultsmentioning

confidence: 99%