2015
DOI: 10.1021/cm504532w
|View full text |Cite
|
Sign up to set email alerts
|

Thin Films of Molybdenum Disulfide Doped with Chromium by Aerosol-Assisted Chemical Vapor Deposition (AACVD)

Abstract: A combined single-source precursor approach has been developed for the deposition of thin films of Cr-doped molybdenum disulfide (MoS2) by aerosol-assisted chemical vapor deposition (AACVD). Tris­(diethyldithiocarbamato)­chromium­(III) can also be used for the deposition of chromium sulfide (CrS). Films have been analyzed by a range of techniques including scanning electron microscopy (SEM), energy dispersive X-ray (EDX) spectroscopy, Raman spectroscopy, and powder X-ray diffraction (pXRD) to elucidate film mo… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

6
77
0

Year Published

2015
2015
2023
2023

Publication Types

Select...
9

Relationship

2
7

Authors

Journals

citations
Cited by 79 publications
(85 citation statements)
references
References 53 publications
6
77
0
Order By: Relevance
“…Another metal sulfide thin film that has been successfully deposited via AACVD is MoS 2 . [45] This is am aterial that displays excellent lubricity ands oi sc ommonly used as al ubricant in industrial applicationsi nw hich high temperatures and pressures are typical, at which point traditional organic lubricants would degrade. In this study [Mo(S 2 CN(C 2 H 5 ) 2 ) 4 ]w as used to deposit MoS 2 thin films.…”
Section: Deposition Of Binarym Etal Sulfidematerialsmentioning
confidence: 99%
“…Another metal sulfide thin film that has been successfully deposited via AACVD is MoS 2 . [45] This is am aterial that displays excellent lubricity ands oi sc ommonly used as al ubricant in industrial applicationsi nw hich high temperatures and pressures are typical, at which point traditional organic lubricants would degrade. In this study [Mo(S 2 CN(C 2 H 5 ) 2 ) 4 ]w as used to deposit MoS 2 thin films.…”
Section: Deposition Of Binarym Etal Sulfidematerialsmentioning
confidence: 99%
“…¥ÑÒËÓÑÄÂÐËÇ ¥±® ÂÕÑÏÂÏË VI ÅÓÖÒÒÞ (Cr) ÒÓËÄÑ-AEËÕ Í ÔÕÓÖÍÕÖÓÐÞÏ ËÊÏÇÐÇÐËâÏ Ä ÅÇÑÏÇÕÓËË ÏÂÕÇÓËÂÎÂ, ÖÄÇÎËÚËÄÂÇÕ àÎÂÔÕËÚÐÞÇ ÔÄÑÌÔÕÄÂ Ë AEÇÎÂÇÕ ÇÅÑ ÏÑÓ×ÑÎÑ-ÅËá ÃÑÎÇÇ ÊÇÓÐËÔÕÑÌ [168]. ¥ÑÒËÓÑÄÂÐËÇ SnSe ÂÕÑÏÂÏË Ga, As ËÎË Sb ÒÓËÄÑAEËÕ Í ÒÑâÄÎÇÐËá ÒÑÎÖÒÓÑÄÑAEâÜËØ ÔÄÑÌÔÕÄ,  ÂÕÑÏÂÏË In ì ÒÑÎÖÏÇÕÂÎÎËÚÇÔÍËØ ÔÄÑÌÔÕÄ [169].…”
Section: à2mentioning
confidence: 99%
“…Finally, the adsorbed precursors react and deposit on the substrate relatively uniformly, and the byproducts are diffused. Lewis et al (2015) fabricated chromium (Cr)-doped MoS 2 via AACVD. The precursor was prepared as a solution by mixing tetrakis(diethyldithiocarbamato)molybdenum(IV) (MoL 4 ) and tris(diethyldithiocarbamato)chromium(III) (CrL 3 ) and dissolving the mixture in 25 mL of tetrahydrofuran (THF).…”
Section: Aerosol-assisted Chemical Vapor Depositionmentioning
confidence: 99%