2017
DOI: 10.1002/pssa.201700520
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Thin Films of Copper (I) Iodide Doped with Iodine and Thiocyanate

Abstract: It is found that thiocyanate (SCN) is an alternative dopant that greatly stabilizes the p‐type semiconducting properties of CuI. Thiocyanate doping can be achieved by a complete removal of the excess iodine and introduction of thiocyanate via suitable precursors at ambient temperature. A method of removal of iodine from CuI before casting films is described. The electrical and optical properties of thiocyanate‐doped CuI thin films are also discussed.

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Cited by 14 publications
(15 citation statements)
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“…Considering the easy generation of V i during the film coating/annealing processes due to its low formation energy, thiocyanate (SCN − ) was blended into CuI to stabilize the lattice iodine and form smooth and compact composite films. [ 114 , 115 , 116 ] By creating an I‐rich environment during reactive sputtering, the CuI film conductivity increased from 156 to 283 S cm −1 . [ 102 ] The same phenomenon was observed using the solution process by directly adding iodine solution into the CuI precursor, leading to a conductivity enhancement of more than two orders of magnitude.…”
Section: Cui Introduction Deposition Method and Electrical Property Modulationmentioning
confidence: 99%
“…Considering the easy generation of V i during the film coating/annealing processes due to its low formation energy, thiocyanate (SCN − ) was blended into CuI to stabilize the lattice iodine and form smooth and compact composite films. [ 114 , 115 , 116 ] By creating an I‐rich environment during reactive sputtering, the CuI film conductivity increased from 156 to 283 S cm −1 . [ 102 ] The same phenomenon was observed using the solution process by directly adding iodine solution into the CuI precursor, leading to a conductivity enhancement of more than two orders of magnitude.…”
Section: Cui Introduction Deposition Method and Electrical Property Modulationmentioning
confidence: 99%
“…[1,[16][17][18] However, doping attempts with iodine, exploiting the intrinsic defects, are inconclusive and seemingly dependent on the growth technique. [19][20][21] Recent results of PLD grown CuI capped with amorphous Al 2 O 3 suggest an extrinsic influence on the electrical properties. [22] In particular, the incorporation of oxygen acceptors in combination with diffusion through the Al 2 O 3 capping dominates the conductivity.…”
Section: Introductionmentioning
confidence: 99%
“…For instance, the electrical and luminescence properties of Zn 2+ ‐doped CuI and properties of Li + ‐doped CuI were investigated separately while more possible dopants, like Ga and Al, still remain theoretical . And CuI film doped with excessive anions, such as iodine and thiocyanate, was also reported . Recently, p‐type transparent amorphous Cu‐Sn‐I film was prepared by spin‐coating of 2‐methoxyethanol solution of CuI and annealing in Ar atmosphere, and the addition of Sn 4+ acts as an inhibitor of fast crystallization and a stabilizer of CuI structure .…”
Section: Introductionmentioning
confidence: 99%