2000
DOI: 10.1016/s0925-4005(00)00438-x
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Thin film sensors on the basis of chalcogenide glass materials prepared by pulsed laser deposition technique

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Cited by 52 publications
(22 citation statements)
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“…To ensure the patterning of the different thin-film sensors on the silicon chip, a home-made Al mask has been used. The detailed PLD process is described elsewhere [9,10,13]. After cutting the wafer into single sensor chips of 10 mm * 10 mm, each sensor chip has been glued on a printed circuit board (PCB), wire-bonded and encapsulated by an epoxy resin (EPO-TEK 87-GT, Polytec).…”
Section: Fabrication Of the Chalcogenide Glass-based Thin-film Sensormentioning
confidence: 99%
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“…To ensure the patterning of the different thin-film sensors on the silicon chip, a home-made Al mask has been used. The detailed PLD process is described elsewhere [9,10,13]. After cutting the wafer into single sensor chips of 10 mm * 10 mm, each sensor chip has been glued on a printed circuit board (PCB), wire-bonded and encapsulated by an epoxy resin (EPO-TEK 87-GT, Polytec).…”
Section: Fabrication Of the Chalcogenide Glass-based Thin-film Sensormentioning
confidence: 99%
“…Thus, a nearly perfect stoichiometric transfer from the target material to the silicon substrate can be assumed. Former investigations in terms of the thin-film composition, also done by the authors, are published elsewhere [9,10,13,14]. …”
Section: Physical Characterization Of the Chalcogenide Glass-based Thmentioning
confidence: 99%
“…Rather new method used is spin-coating technique [9,10]. By the means of the PLD technique, a potentiometric thin film sensor can be realized on the basis of chalcogenide glasses (in particular, Ag-As-S) [11].…”
Section: Introductionmentioning
confidence: 99%
“…A rather new method used is spincoating technique [9,10]. By the means of the PLD technique, a potentiometric thin film sensor can be realized on the basis of chalcogenide glasses (in particular Ag-As-S) [11].…”
Section: Introductionmentioning
confidence: 99%