Thin Film Growth Through Sputtering Technique and Its Applications

Alfonso, Edgar; Olaya, Jhon J; Cubillos, G.I.

doi:10.5772/35844

Cited by 57 publications

(46 citation statements)

References 57 publications

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“…The structural morphologies have three well-defined structural zones 26,27,28 : The first zone -T s /T m <0.3 -is characterized by small, elongated grains, with a columnar structure and a porous morphology, where there is a weak binding between the grains. The columnar structure is produced by low diffusion of surface adsorbed atoms through the substrate and atomic shadow effects that are dependent on the speed of growth of the columns and on the various incidence angles when the atoms reach the substrate surface.…”

Section: Introductionmentioning

confidence: 99%

Deposition of TiO2 Film on Duplex Stainless Steel Substrate Using the Cathodic Cage Plasma Technique

et al. 2016

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This research used the "cathodic cage (CC)" technique for TiO 2 film deposition on duplex stainless steel substrate. This technique uses a multiple hollow cathode effect. Duplex stainless steel substrates were treated at temperatures of 300 o C, 350 o C and 400 o C, giving a temperature value ratio (T s /T m ) of 0.27 to 0.31 (Ts being the substrate temperature and Tm the melting temperature of the deposited material). Treatment times of 1, 2 and 4 hours were administered and polycrystalline TiO 2 films were obtained. The films were analyzed by optical microscopy (OM), X-ray diffraction (XRD), Raman spectroscopy and scanning electron microscopy (SEM). During analysis, the formation of uniform films and the possibility of controlling the TiO 2 phase were observed. It was also shown that with longer treatment times and higher temperatures the rutile phase predominates. For treatment times of 4 hours at all temperatures, the rutile structure was present. With treatment times of less than 4 hours, anatase was present. In addition, results showed that this simple, low cost technique can be an alternative method for depositions of TiO 2 films, with the advantage of high levels of control over porosity, thickness and phase composition (anatase and rutile).

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Section: Introductionmentioning

confidence: 99%

Deposition of TiO2 Film on Duplex Stainless Steel Substrate Using the Cathodic Cage Plasma Technique

et al. 2016

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“…As indicated in the curve, the (RMS) increase with energy and have maximum value at pulse energy of (150 mJ) after that decrease, this behavior is due to that at low pulse energies the resultant heat and kinetic energy of the plume species is relatively low which result to formation of coarse film due to the less mobility and lateral diffusion of particles on the substrate to coalesce and make continuous smooth film, on the other hand the film become smoother due reduction of the particulates reaching the substrate resulted from increase in the laser pulse energy which leads to vaporization of particulates contributing in roughness also increasing the laser pulse energy increase the mobility of the particles and enhance the film quality with relatively low roughness. Also the ionic content in the plume rises due to the increment of incident laser energy and this higher ionic content helps the crystalline growths [24].…”

Section: Resultsmentioning

confidence: 99%

Investigation of the Dependence of Thickness and Roughness of TiO<sub>2</sub> Thin Films Fabricated Using Pulsed Laser Deposition on the Laser Energy

Salih¹

2019

AJPST

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In this work Titanium Dioxide thin films were successfully deposited on glass substrates at room temperature by pulsed laser deposition technique (PLD) using a Q-switch Nd: YAG laser to fabricate thin films. The target was an Anatase TiO 2 powder that converted to solid disks by compressing it. The disks were irradiated with different laser pulse energies (100, 150 and 200 mJ) with the same number of laser pulses (10 pulses) and the same laser repetition rate to fabricate three groups of thin film (I, II and III). An atomic force microscopy (AFM) was used for the characterization of the thickness and topography of these thin films. The results showed that the thickness of the films was in the range of hundreds nanometers and it is increased exponentially with the laser energy. The dependence of the root means squire roughness (RMS) on laser pulse energy also was investigated and the results showed that the (RMS) increase exponentially as laser pulse energy to specific value, and then decrease exponentially that the whole curve looks like Gaussian shape.

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“…The deposition conditions for LTO:Fe-LC and LTO:Fe-HC are shown in Table 1. According to [27], the main variables that influence the structure in thin films during a sputtering process are the substrate temperature, substrate, working pressure, atmosphere, and RF power. All the aforementioned variables were kept constant in the sputtering process of our thin films, with the exception of the RF power, which was varied slightly (50 W for LTO: Fe-HC and 30 W for LTO: Fe-LC).…”

Section: Methodsmentioning

confidence: 99%

Iron-Doped Lithium Tantalate Thin Films Deposited by Magnetron Sputtering: A Study of the Iron Role in the Structure and the Derived Magnetic Properties

et al. 2020

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Fe-doped LiTaO3 thin films with a low and high Fe concentration (labeled as LTO:Fe-LC and LTO:Fe-HC, respectively) were deposited by magnetron sputtering from two home-made targets. The dopant directly influenced the crystalline structure of the LiTaO3 thin films, causing the contraction of the unit cell, which was related to the incorporation of Fe3+ ions into the LiTaO3 structure, which occupied Li positions. This substitution was corroborated by Raman spectroscopy, where the bands associated with Li-O bonds broadened in the spectra of the samples. Magnetic hysteresis loops, zero-field cooling curves, and field cooling curves were obtained in a vibrating sample magnetometer. The LTO:Fe-HC sample demonstrates superparamagnetic behavior with a blocking temperature of 100 K, mainly associated with the appearance of Fe clusters in the thin film. On the other hand, a room temperature ferromagnetic behavior was found in the LTO:Fe-LC layer where saturation magnetization (3.80 kAm−1) and magnetic coercivities were not temperature-dependent. Moreover, the crystallinity and morphology of the samples were evaluated by X-ray diffraction and scanning electron microscopy, respectively.

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Thin Film Growth Through Sputtering Technique and Its Applications

Cited by 57 publications

References 57 publications

Deposition of TiO2 Film on Duplex Stainless Steel Substrate Using the Cathodic Cage Plasma Technique

Deposition of TiO2 Film on Duplex Stainless Steel Substrate Using the Cathodic Cage Plasma Technique

Investigation of the Dependence of Thickness and Roughness of TiO<sub>2</sub> Thin Films Fabricated Using Pulsed Laser Deposition on the Laser Energy

Iron-Doped Lithium Tantalate Thin Films Deposited by Magnetron Sputtering: A Study of the Iron Role in the Structure and the Derived Magnetic Properties

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Thin Film Growth Through Sputtering Technique and Its Applications

Cited by 57 publications

References 57 publications

Deposition of TiO2 Film on Duplex Stainless Steel Substrate Using the Cathodic Cage Plasma Technique

Deposition of TiO2 Film on Duplex Stainless Steel Substrate Using the Cathodic Cage Plasma Technique

Investigation of the Dependence of Thickness and Roughness of TiO&lt;sub&gt;2&lt;/sub&gt; Thin Films Fabricated Using Pulsed Laser Deposition on the Laser Energy

Iron-Doped Lithium Tantalate Thin Films Deposited by Magnetron Sputtering: A Study of the Iron Role in the Structure and the Derived Magnetic Properties

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Investigation of the Dependence of Thickness and Roughness of TiO<sub>2</sub> Thin Films Fabricated Using Pulsed Laser Deposition on the Laser Energy