Thin cobalt oxide films for catalysis deposited by plasma-enhanced metal–organic chemical vapor deposition

Al-Co Alloys Prepared by Vacuum Arc Melting: Correlating Microstructure Evolution and Aqueous Corrosion Behavior with Co Content

“…Moreover, the majority of the Raman spectra present a wide hump starting from about 450 cm −1 and extending up to about 600 cm −1 . This amorphicity can be attributed to the presence of amorphous cobalt oxide or cobalt oxide dispersed species [67,68]. The main peaks of Co3O4, CoO and CoOOH are discerned protruding from this hump along with peaks assigned to Al2O3-hydrates.…”

“…All four main forms of alumina hydroxides/oxyhydroxides have been detected, namely, bayerite {α-Al(OH)3} and gibbsite {γ-Al(OH)3}, diaspore {α-AlOOH}, and boehmite {γ-AlOOH}. A differentiation between the various forms of alumina hydrates, as well as cobalt oxides/hydroxides on the basis of the observed peak wavenumbers and relevant literature [39,67,[69][70][71][72][73][74][75][76][77], is attempted in Table 6. Three main types of Raman spectra are observed in Figure 11: (i) Spectra with predominance of bands corresponding to aluminum hydroxides/oxyhydroxides, where bands ascribed to characteristic vibrations of Co-O-Co bonds also present accountable intensity (7Co_2, 7Co_3, 20Co_1, 20Co_3).…”

Cold Plasma – A Promising Tool for the Development of Electrochemical Cells

“…Many different methods have been applied to prepare these coatings, among others, also the cold plasma deposition technique -both PECVD and reactive sputtering. In PECVD, cobalt oxide films were obtained from volatile precursors such as bis(acetylacetonate)cobalt(II) (Fujii et al, 1995), bis(2,2,6,6-tetramethylheptan-3,5-dionato)cobalt(II) (Barreca et al, 2011), bis(cyklopentadienyl)cobalt(II) (Donders et al, 2011) or cyclopentadienyl(dicarbonyl)cobalt(I) (Tyczkowski et al, 2007). Other volatile cobalt complexes (e.g.…”

“…If CoO X films were fabricated on a substrate at elevated temperature (150-400°C), then columnar grains with average diameter size at the film surface of 35-60 nm were formed (Fujii et al, 1995). Research conducted recently in our laboratory has led to the cobalt oxide films containing 4-8 nm sized Co 3 O 4 crystals, whose size can be controlled by the plasma deposition process Tyczkowski et al, 2007). These films will be discussed in more detail in Sec.…”

“…In the same way as the films with CoO X , films containing CuO X were deposited using bis(acetylacetonate)copper(II) (Cu(acac) 2 ). After feeding the reactor by a mixture of CpCo(CO) 2 and Cu(acac) 2 vapors, thin films of Co-Cu mixed oxides were also fabricated Tyczkowski et al, 2007). Fig.…”