Cold Plasma – A Promising Tool for the Development of Electrochemical Cells

Tyczkowski, J.

doi:10.5772/33974

Cited by 6 publications

(13 citation statements)

References 105 publications

(112 reference statements)

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“…As an example, the dependence of diameter of Pd nanoparticles on the sputtering time (Ar plasma, 100 MHz) is shown in Figure 7. The metal and metal oxide nanoparticles are used primarily as catalytic materials for fuel cell electrodes, and mainly in this respect, the plasma sputtering has been intensively investigated over the past 15 years [17]. It has been shown that Pt, Pd, Rh, Pt X Rh Y , Pt X Ru Y , Pt-RuO X , Ni X Zr Y , PtNiZr, NiZrPtRu, CoO X , NbO X , NbO X N Y , Pd X Au Y, and others can be plasma-sputtered and deposited in the electrocatalytic active form [73][74][75][76][77][78][79][80][81][82][83][84][85].…”

Section: Plasma Sputtering Of Catalytic Nanoparticlesmentioning

confidence: 99%

“…The advantageous effect of reducing the amount of catalyst is clearly visible [86]. The method of plasma spraying has proven to be very useful in the preparation of 3D-catalysts [17]. Already in the early 2000s, Brault et al [87,88] applied this method to introduce Pt clusters into a porous carbon material forming 3D-electrodes for PEM fuel cells.…”

Section: Plasma Sputtering Of Catalytic Nanoparticlesmentioning

confidence: 99%

“…This method of thin-film deposition, well known as the plasma polymerization or plasma-enhanced chemical vapor deposition (PECVD), has already been used to fabricate a lot of thin-film materials for various practical applications [94]. In the late 1980s, a possibility of using PECVD to produce thin films having potential catalytic properties, such as Pd, Rh, Pt, was already mentioned [95][96][97][98]; however, only recently the involvement of this method in the field of catalysis has become a reality [3,15,17].…”

Section: Plasma-deposited (Pecvd) Thin Films With Catalytic Propertiesmentioning

confidence: 99%

“…They can also be used as catalytic deposits on the surface of fuel cell electrodes without practically any changes in their electrical conductivity and gas permeability. Further advancement is also expected with regard to new sophisticated thin films for photocatalytic splitting of water molecules and efficient production of hydrogen [17]. Apart from the thin catalytic coating deposition, the cold plasma is also utilized in preparations of conventional catalysts, through both plasma enhanced "classical" synthesis and plasma modification of as-prepared "conventional" catalysts [2,15].…”

Section: Introductionmentioning

confidence: 99%

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Cold Plasma Produced Catalytic Materials

Tyczkowski¹

2016

Plasma Science and Technology - Progress in Physical States and Chemical Reactions

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The cold plasma techniques are widely applied to create new materials possessing unique properties, which cannot be prepared by any other methods. "mong the many interesting substances produced with the participation of cold plasma, a special place is occupied by materials with catalytic properties. The chapter gives a brief review of various cold plasma methods used for the preparation of catalytic materials from the plasma modification of conventional catalysts via plasma-enhanced classical synthesis of catalysts to the advanced thin catalytic films fabricated by plasma sputtering processes but primarily by plasma deposition from metalorganic precursors PECVD . Recently, the catalytic films have attracted considerable attention due to the possibility of depositing them as very thin coatings on virtually all supports without any change in their geometry. Such coatings open the way for new reactor designs, so-called structured reactors, designated for various chemical processes. They can also be used as catalytic deposit on the surface of electrodes for fuel cells and photoelectrodes for water splitting processes. Recent developments in this field and further prospects for thin catalytic films are discussed, all the more so because it is one of the main areas of research in our department.Keywords: Catalysts, plasma treatment, PECVD, structured reactors, fuel cells, water splitting . IntroductionFor a long time, plasma techniques have been used in the creation of new materials possessing unique properties, which cannot be fabricated by other methods. " particularly important technique, giving plenty of possibilities, is the plasma deposition of entirely new, advanced materials in the form of solid coatings having unusual molecular structure and sophisticated nanomorphology. The plasma processes can also be used to modify conventional materials through treating them during or after "classical" synthesis, which generally leads to new © 2016 The Author(s). Licensee InTech. This chapter is distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/3.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.substances with disparate properties, often more suitable than those of the unmodified materials."mong the many interesting products fabricated by plasma techniques, materials with catalytic properties occupy a special place. There exist a lot of catalytic reactions, for example, combustion of organic volatile compounds, CO methanation, Fischer Tropsch synthesis, water photo-splitting, fuel cell electrode processes, and many others, which challenge chemists all over the world to seek better catalysts or more effective catalyst preparation methods. It seems that the plasma techniques pave the way for novel solutions in this field.In general, plasma techniques used in the preparation of catalysts can be categorized into one of two groups depending on the plasma type thermal equilibrium pl...

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Section: Plasma Sputtering Of Catalytic Nanoparticlesmentioning

confidence: 99%

Section: Plasma Sputtering Of Catalytic Nanoparticlesmentioning

confidence: 99%

Section: Plasma-deposited (Pecvd) Thin Films With Catalytic Propertiesmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Cold Plasma Produced Catalytic Materials

Tyczkowski¹

2016

Plasma Science and Technology - Progress in Physical States and Chemical Reactions

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“…The non-thermal plasma is the type of plasma that is used in most of the scientific researches . It is classified into two kinds : equilibrium plasma and nonequilibrium plasma [5] .It has been widely used in industry especially in preparing and depositing thin films [6].…”

Section: Introductionmentioning

confidence: 99%

Study of the effect of non-thermal plasma on the structural properties of pure Cadmium Oxide thin Films (CdO) prepared by Pulsed laser Deposition Technique ( PLD )

Ali¹,

Noor²,

Hussain³

2019

JK-Physics

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In this research, the preparation of pure ( CdO ) films on a glass substrate were conducted using a pulsed laser deposition method (PLD) . The deposition of the films was done at different times ( 5 , 10 , 15, 20 ) minutes at room temperature. The effect of non-thermal plasma on these prepared films in two exposure times of (30, 60) minutes was studied. The results of X-ray diffraction (XRD) of the prepared pure ( CdO) films showed that the films have a polycrystalline structure of cubic phase with preferred orientation (111). It was noted that the increase of deposition time of (Nd : YAG) laser, reduces the intensity of diffraction peaks at (111 ) , (200) , (220) . The results of (XRD) have also shown that when the prepared pure ( CdO ) films are exposed to the non-thermal plasma, their crystalline structure was not affected. The tests also showed that the increase of the exposure time to non-thermal plasma causes a decrease in the intensity of the diffraction peaks. The (AFM) tests also demonstrated that the changing in ( RMS ) of the surface roughness is irregular and it was found that the ( RMS ) increases by increasing the deposition time.

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