Thin amorphous silicon films crystallization upon flexible substrates

Abstract

A novel method for thin silicon films crystallization that combines advantages of laser- and metal-induced crystallization technologies is reported. Polycrystalline silicon films were synthesized on flexible polyimide substrates following the proposed approach. Films obtained possess high crystal structure regularity and crystallinity.

Heat transfer estimation during laser-assisted metal-induced crystallization of amorphous silicon films

“…Using of such substrates (glass or plastic) has two main advantages: decrease of the end product cost and extension of the possible application toward wearable devices. An original approach to amorphous silicon film crystallization on glass [2] and polyimide [3] substrates was developed by our group. This approach using common fiber 1064 nm laser and thin metal layer for laser power absorption on the top of the a-Si film to be crystallized.…”