1995
DOI: 10.1116/1.579552
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Thickness determination of uniform overlayers on rough substrates: A comparison of calculations for Al2O3/Al to x-ray photoelectron spectroscopy and atomic force microscopy experiments on technical aluminum foils

Abstract: Thickness determination of uniform overlayers on rough substrates: A comparison of calculations for Al2O3/Al to x-ray photoelectron spectroscopy and atomic force microscopy experiments on technical aluminium foils.

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Cited by 16 publications
(1 citation statement)
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“…The reduced thickness of nanocoatings commonly requires the use of very specific characterization techniques like those based on X‐ray photoelectron spectroscopy, 19,20 atomic force and electron microscopy, 21,22 Rutherford backscattering spectroscopy, 23 ellipsometry, 4,13,15,16,18,24–26 or transmittance‐reflectance spectroscopy, 8,27,28 among others. These techniques require long acquisition times, sample destruction, and/or high‐energy (deep UV or X‐ray) excitation wavelengths.…”
Section: Introductionmentioning
confidence: 99%
“…The reduced thickness of nanocoatings commonly requires the use of very specific characterization techniques like those based on X‐ray photoelectron spectroscopy, 19,20 atomic force and electron microscopy, 21,22 Rutherford backscattering spectroscopy, 23 ellipsometry, 4,13,15,16,18,24–26 or transmittance‐reflectance spectroscopy, 8,27,28 among others. These techniques require long acquisition times, sample destruction, and/or high‐energy (deep UV or X‐ray) excitation wavelengths.…”
Section: Introductionmentioning
confidence: 99%