Thickness dependence of the optical properties of sputter deposited Ti oxide films

Rodríguez, Juan Rodríguez; Gómez, Mónica; Ederth, J.; Niklasson, Gunnar A.; Granqvist, Claes G.

doi:10.1016/s0040-6090(99)01109-8

Cited by 121 publications

(59 citation statements)

References 29 publications

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“…Calculations were also done for n AR = 2.1, which is typical for sputter-deposited TiO 2 films. 71 However, the results were not significantly better than those for n AR = 1.5 and are not further discussed here. 61 who found ΔT sol ≈ 15% together with T lum (τ < τ c ) and T lum (τ > τ c ) being 49.5% and 45%, respectively.…”

Section: A Thin Filmsmentioning

confidence: 71%

Thermochromic undoped and Mg-doped VO₂ thin films and nanoparticles: Optical properties and performance limits for energy efficient windows

Niklasson

Granqvist

2014

Journal of Applied Physics

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Undoped and Mg-doped thermochromic VO 2 films with atom ratios z ≡ Mg/(Mg + V) of 0 ≤ z < 0.21 were deposited by reactive DC magnetron sputtering onto heated glass and carbon substrates. Elemental compositions were found by Rutherford backscattering spectrometry. Optical constants were determined from transmittance and reflectance measurements and were used for modeling the optical properties of thin films and dilute nanoparticle composite layers below and above the critical temperature for thermochromic switching between a low-temperature infrared transparent state and a high-temperature infrared reflecting or absorbing state. Mgdoped films showed superior luminous transmittance T lum and solar transmittance modulation ΔT sol compared to undoped VO 2 films, and both of these parameters could be further enhanced by anti-reflection. VO 2 -containing nanocomposites had much larger values of T lum and ΔT sol than VO 2 -based films. Mg-doping was found to erode the properties of the nanocomposites. Approximate performance limits are given on T lum and ΔT sol for thermochromic VO 2 films, with and without Mg doping and antireflection coating, and also for VO 2 -containing dilute nanocomposites.--

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Section: A Thin Filmsmentioning

confidence: 71%

Thermochromic undoped and Mg-doped VO₂ thin films and nanoparticles: Optical properties and performance limits for energy efficient windows

Niklasson

Granqvist

2014

Journal of Applied Physics

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“…Many reports on the effect of size on thin films of various materials have been published. [11][12][13][14][15] However, only few works on the dependence of the properties nickel oxide films on film thickness have been published. 16) Nickel oxide films obtained by sputtering onto glass substrate at 303 and 673 K were analyzed to understand the role of film thickness on the structural and electrical properties of the nickel oxide films.…”

Section: Introductionmentioning

confidence: 99%

Effect of Film Thickness on Structural and Electrical Properties of Sputter-Deposited Nickel Oxide Films

Chen

Hwang

2005

Mater. Trans.

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This work studies dependences of resistivity, carrier concentration, mobility and structural properties on the thickness of nickel oxide (NiO) films deposited onto glass substrates by RF magnetron sputtering in a pure oxygen atmosphere at an RF power 200 W. The electrical properties were measured by Hall Effect measurements. The X-ray diffraction (XRD) and transmission electron microscope (TEM) analyses of nickel oxide films indicates that these films are polycrystalline when the samples are prepared with an unheated substrate (T s ¼ 303 K) and using a substrate at a higher substrate temperature (T s ¼ 673 K). The thickness of the films varied in the range from 50 to 300 nm. The variations of the microstructural parameters, such as crystallite size (L), dislocation density (), stacking fault probability (), strain (") and density (D), with film thickness and substrate temperature were investigated. The results show the crystallite sizes increaser as the thickness of the film increases. The variation of the dislocation density and the stacking fault probabilities and strain decrease as the thickness increases. The resistivity of NiO film is increased with an increase in film thickness, which is related to the decrease of carrier concentration with film thickness. The NiO film with a thickness of 200 nm has a minimum resistivity of 0:69 Â 10 À2 m when deposited at substrate temperature of 303 K.

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“…In the abstract of the paper the authors comment: "more recent 'polaron' spectra in WO 3 films may also be artifacts," with reference to a recent paper of ours. 1 However, this claim was not substantiated in the paper of Scott et al, our measurements on WO 3 were not discussed any further.…”

mentioning

confidence: 74%

“…The method used by us to extract the absorption coefficient uses a well-known approximation 2 with good accuracy when compared to numerical simulation of R and T spectra. 3 2. For as-deposited, unintercalated WO 3 films, the interference fringes observed in R and T measurements are not visible in the absorption coefficient derived from Eq.…”

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confidence: 99%

See 1 more Smart Citation

Comment on “Infrared spectra and second-harmonic generation in barium strontium titanate and lead zirconate titanate thin films: ‘Polaron’ artifacts” [J. Appl. Phys. 94, 3333 (2003)]

Niklasson

Berggren

Azens

2004

Journal of Applied Physics

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Scott et al. [Scott et al., J. Appl. Phys. 94, 3333 (2003)] have questioned our measurements of the optical absorption of amorphous tungsten oxide, and have suggested that the polaron absorption might be an artifact due to interference effects. In this comment we point out that we obtained the absorption coefficient from measurements of both the transmittance and the reflectance of thin films deposited on transparent substrates. By this method the “true” absorption is easily obtained.

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Thickness dependence of the optical properties of sputter deposited Ti oxide films

Cited by 121 publications

References 29 publications

Thermochromic undoped and Mg-doped VO₂ thin films and nanoparticles: Optical properties and performance limits for energy efficient windows

Thermochromic undoped and Mg-doped VO₂ thin films and nanoparticles: Optical properties and performance limits for energy efficient windows

Effect of Film Thickness on Structural and Electrical Properties of Sputter-Deposited Nickel Oxide Films

Comment on “Infrared spectra and second-harmonic generation in barium strontium titanate and lead zirconate titanate thin films: ‘Polaron’ artifacts” [J. Appl. Phys. 94, 3333 (2003)]

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Thickness dependence of the optical properties of sputter deposited Ti oxide films

Cited by 121 publications

References 29 publications

Thermochromic undoped and Mg-doped VO2 thin films and nanoparticles: Optical properties and performance limits for energy efficient windows

Thermochromic undoped and Mg-doped VO2 thin films and nanoparticles: Optical properties and performance limits for energy efficient windows

Effect of Film Thickness on Structural and Electrical Properties of Sputter-Deposited Nickel Oxide Films

Comment on “Infrared spectra and second-harmonic generation in barium strontium titanate and lead zirconate titanate thin films: ‘Polaron’ artifacts” [J. Appl. Phys. 94, 3333 (2003)]

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Thermochromic undoped and Mg-doped VO₂ thin films and nanoparticles: Optical properties and performance limits for energy efficient windows

Thermochromic undoped and Mg-doped VO₂ thin films and nanoparticles: Optical properties and performance limits for energy efficient windows