2001
DOI: 10.1016/s0022-0248(01)00832-6
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Thick films of X-ray polycrystalline mercuric iodide detectors

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Cited by 91 publications
(60 citation statements)
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“…(Schieber et al 1999, Schieber et al 2001 PVD deposition was performed in a vacuum reactor where high purity HgI 2 powder was evaporated and deposited on arrays. The temperatures used during deposition were chosen based on a number of criteria, most importantly to encourage the c-axis of the crystal to grow perpendicularly to the array surface and to keep the temperature well below a value (~230° C) at which damage to the arrays would occur.…”
Section: Hgi 2 Fabricationmentioning
confidence: 99%
“…(Schieber et al 1999, Schieber et al 2001 PVD deposition was performed in a vacuum reactor where high purity HgI 2 powder was evaporated and deposited on arrays. The temperatures used during deposition were chosen based on a number of criteria, most importantly to encourage the c-axis of the crystal to grow perpendicularly to the array surface and to keep the temperature well below a value (~230° C) at which damage to the arrays would occur.…”
Section: Hgi 2 Fabricationmentioning
confidence: 99%
“…The bulk crystalline phase has a melting point at 408 o C, a dielectric constant equal to 21, a mass density of 6.2 g/cm 3 and forbidden band gap of 2.34 eV. Its atomic number is Z Pb = 82 and Z I = 53 [8].…”
Section: Introductionmentioning
confidence: 99%
“…HgI 2 films were previously obtained by physical vapor transport (PVT) and physical vapor deposition (PVD) [13][14]. In order to look for a cheaper fabrication process, we used the solvent evaporation technique, which was already used for crystals growth [1,15].…”
Section: Methodsmentioning
confidence: 99%