Thermoluminescence assessment of 0.5, 1.0 and 4.0 µm thick HFCVD undoped diamond films

Abstract

Chemical vapor deposition (CVD) diamond has not found extensive application as a thermoluminescence (TL) dosimeter, mainly because its TL glow curve shape is not reproducible. A slight variation in the growing conditions may result in strong changes in the morphology, microstructure, and surfaceimpurity-related defects, considerably affecting the TL glow curve features. In order to study the main TL characteristics under controlled growing conditions, we present results on three 0.5, 1.0, and 4.0 m thick hot filament CVD (HFCVD) diamond films grown on Si (100) substrates. The recorded TL glow curves were resolved into individual peaks by a home-made deconvolution program and the kinetic parameters of the peaks were extracted. The best fits of the TL glow curves were obtained using four peaks, except for the 4.0 m thick sample that required five TL components. All samples showed three high intensity TL peaks between 180-400 • C and a less intense one or two peaks in the 100-180 • C low-temperature region. The lowtemperature components all obey second-order kinetics while the high-temperature ones obey first and 1.6 order kinetics. The samples showed similar TL peaks with comparable kinetics parameters. It is concluded that the manufacturing of high quality HFCVD diamond may require a further improvement in the growing process in order to exploit its excellent tissueequivalence properties in clinical and medical applications.

Thermoluminescence properties of undoped diamond films deposited using HF CVD technique

“…The Raman spectroscopy is a fingerprint of each crystal structure, therefore it is an ideal and nondestructive tool for detection of different forms of crystalline and amorphous carbons, characterized by sp 2 and sp 3 hybridized C-C bonds [23] and for this reason it is also frequently used for the analysis of CVD diamond quality.…”

TL and OSL studies on undoped diamond films grown by hot filament chemical vapor deposition

“…Till date, the maximum work related to dosimetry studies on diamond has 2 remained confined to the films grown by microwave plasma assisted CVD and very little work has been done on the films grown by HFCVD method, especially the OSL part for un-doped diamond films prepared by this technique has not been reported in detail so far. It is worth mentioning here that the TL and OSL responses in diamond films grown by different methods cannot be compared exactly as the deposition condition has strong influence on the crystal structure, surface morphology, microstructure and defect or trap density in the deposited film which in turn can change the luminescence property completely [9]. In the TL/OSL dosimetry aspects of HFCVD grown diamond, the works reported by Goncalves et al [10] and Pedroza-Montero et al [11] are notable but they have used boron doped diamond.…”

“…The undoped diamond films are easy to prepare than the doped ones and thus the possibility of its use in radiation dosimeters need to be explored thoroughly. Some authors have reported TL of the undoped diamond films grown by HFCVD method [9,12]. In the present work, diamond films were formed by HFCVD method and the as deposited film was investigated for TL and OSL responses.…”

Raman and Thermoluminescence Studies of HPHT Synthetic Nanodiamond Powders

“…Most of studies are devoted to CVD diamond films grown on various substrates (see for instance ref. and references therein). Another synthetic diamond is high pressure–high temperature (HPHT) diamond that is commercially available since 1950s with main application as cutting and drilling tools.…”