Metalorganic vapor phase epitaxy of InN layers on sapphire was studied in-situ by spectroscopic ellipsometry (SE), ex-situ atomic force microscopy and optical microscopy. Surface morphology has been largely improved by using nitrogen instead of hydrogen as carrier gas during sapphire nitridation. Using the sensitivity of in-situ SE with respect to roughness we established a new growth procedure with low V/III ratio (10 4 ) at high temperature (580 °C) and growth rates as high as 350 nm/h, leading to improved electronic layer properties and allowing for growth of comparably thick layers.