Thermodynamic Modeling of the Ti-Si-C-H-CI-Ar Systemto Determine Optimum Conditions for Chemical Vapor Deposition of Ti3SiC2

Pickering, E.; Lackey, W. J.; Crain, Steven P.

doi:10.1002/9780470294499.ch63

Ceramic Engineering and Science Proceedings

DOI: 10.1002/9780470294499.ch63

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Thermodynamic Modeling of the Ti-Si-C-H-CI-Ar Systemto Determine Optimum Conditions for Chemical Vapor Deposition of Ti3SiC2

E. Pickering

W. J. Lackey

Steven P. Crain

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Thermodynamic Modeling of the Ti-Si-C-H-CI-Ar Systemto Determine Optimum Conditions for Chemical Vapor Deposition of Ti3SiC2

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