2005
DOI: 10.1016/j.jcrysgro.2005.03.010
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Thermodynamic analysis of AlGaN HVPE growth

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Cited by 31 publications
(33 citation statements)
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“…Some research groups have succeeded in growing an AlN or AlGaN substrate to enable homoepitaxial-like growth of Al-rich AlGaN [1][2][3][4][5]. An Al(Ga)N template was successfully grown on a sapphire substrate by HVPE using AlCl 3 as the Al source [1][2][3][4].…”
Section: Introductionmentioning
confidence: 99%
“…Some research groups have succeeded in growing an AlN or AlGaN substrate to enable homoepitaxial-like growth of Al-rich AlGaN [1][2][3][4][5]. An Al(Ga)N template was successfully grown on a sapphire substrate by HVPE using AlCl 3 as the Al source [1][2][3][4].…”
Section: Introductionmentioning
confidence: 99%
“…Some groups are engaged in the fabrication of AlN substrates or AlGaN substrates to enable homoepitaxial growth of AlN [4][5][6][7][8]. Koukitu's group [4][5][6] successfully grew thick AlN and/or AlGaN layers on a sapphire substrate by HVPE using AlCl 3 as the Al source. On the other hand, Kamei et al [8] reported the achievement of AlN growth with low dislocation density by liquid phase epitaxy (LPE).…”
Section: Introductionmentioning
confidence: 99%
“…Prior to the HVPE growth of AlGaN, we have carried out a thermodynamic analysis of the AlGaN HVPE using AlCl 3 and GaCl as the group III precursors [15]. The analysis provides us useful information on the growth rate and the deposition composition for the preparation of AlGaN ternary semiconductors, as well as insight into the crystal growth mechanism.…”
Section: Introductionmentioning
confidence: 99%