1992
DOI: 10.1111/j.1151-2916.1992.tb05567.x
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Thermochemical Etching Method for Ceramics

Abstract: A thermochemical etching procedure, comprising a short chemical etch followed by a low-temperature thermal anneal (typically 10 min at 570% of the sintering temperature), has proved successful for the preparation of alumina, aluminum nitride, and nickel zinc ferrite ceramics for microstructural studies. Good-quality results have been achieved in times much shorter than those normally associated with chemical etching and at temperatures lower than those usually used for thermal etching. Under such conditions, g… Show more

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Cited by 15 publications
(5 citation statements)
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“…Both methods require either the use of hazardous chemicals [2] or long heat treatments that often have to be optimised when working with new materials [3]. Finally, thermal etching could bias the measurements of grain sizes, particularly when grain growth, surface modifications [4,5,6,7], and/or secondary phase precipitation at the grain boundaries [8] occur during the heat treatment.…”
Section: Introductionmentioning
confidence: 99%
“…Both methods require either the use of hazardous chemicals [2] or long heat treatments that often have to be optimised when working with new materials [3]. Finally, thermal etching could bias the measurements of grain sizes, particularly when grain growth, surface modifications [4,5,6,7], and/or secondary phase precipitation at the grain boundaries [8] occur during the heat treatment.…”
Section: Introductionmentioning
confidence: 99%
“…For a ceramic that fractures in the intergranular fracture mode, the contrast between the grains and grain boundaries cannot be easily distinguished on the fracture surface due to the existence of glassy phases and impurities segregated on grain boundaries. In this case, similar post-processing steps, including grinding, polishing, and etching, are needed for successful imaging [5][6][7]. However, during the grinding and polishing processes, the practical morphology of the microstructure could be somehow destroyed [8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…There are several publications presenting recommended conditions for various dense materials. The general recommendation is that the thermal etching should be performed at 50-200 °C below the sintering temperature for a certain amount of time [1][2][3][4][5][6][7]. In addition, there are recommendations which advice to utilize absolute etching temperatures -for an example the thermal etching of alumina: 1500 °C for 20-30 min [1], 1100-1300 °C for 120 min [1], 1300-1400 °C for 15-20 min [6], 1500 °C for 120 min [7].…”
Section: Introductionmentioning
confidence: 99%