Thermo-mechanical properties of alumina films created using the atomic layer deposition technique

Miller, David C.; Foster, Ross R.; Jen, Shih-Hui; Bertrand, Jacob A.; Cunningham, Shawn; Morris, Arthur S.; Lee, Yung-Cheng; George, Steven M.; Dunn, Martin L.

doi:10.1016/j.sna.2010.09.018

Cited by 84 publications

(51 citation statements)

References 90 publications

(149 reference statements)

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“…6(a) indicates that the hardness slope in regime I is 34.75 GPa; thus, according to Eq. (3b), the hardness of Al 2 O 3 ALD is H ALD = 6.4 GPa, consistent with the values of Al 2 O 3 ALD reported in the literature [50]. Moreover, to validate the models proposed, we also studied Al 2 O 3 -ALD-treated NCCs composed of 254 nm SiO 2 NCs (see Fig.…”

Section: Granular Behavior (Regimes I and Ii)supporting

confidence: 86%

Reinforcing nanocolloidal crystals by tuning interparticle bonding via atomic layer deposition

Zhang

Lee

et al. 2015

Acta Materialia

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Section: Granular Behavior (Regimes I and Ii)supporting

confidence: 86%

Reinforcing nanocolloidal crystals by tuning interparticle bonding via atomic layer deposition

Zhang

Lee

et al. 2015

Acta Materialia

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“…25) here] of Al 2 O 3 film. The probability of failure P f was estimated by the probabilistic Weibull distribution, [26][27][28][29][30] where the failure probability for a specimen with a surface area A under uniformly applied stress r is described by function…”

Section: Methodsmentioning

confidence: 99%

Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

Berdova

Ylivaara

Rontu

et al. 2014

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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The fracture strength of Al2O3 membranes deposited by atomic layer deposition at 110, 150, 200, and 300 °C was investigated. The fracture strength was found to be in the range of 2.25–3.00 GPa using Weibull statistics and nearly constant as a function of deposition temperature. This strength is superior to common microelectromechanical systems materials such as diamondlike carbon, SiO2, or SiC. As-deposited membranes sustained high cycling pressure loads >10 bar/s without fracture. Films featured, however, significant reduction in the resistance to failure after annealing (800 °C) or high humidity (95%, 60 °C) treatments.

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“…A) Plot of Gibbs free energy versus P/B ratio at room temperature for selected oxides formed on metals. B) A plot of Gibbs free energy versus P/B ratio at 1000°C [28][29][30][31][32]. Table 1 Comparing molybdenum isotopes [6].…”

Section: Case Study: Materials Selection Criteria For Accident-toleramentioning

confidence: 99%

Materials selection for nuclear applications: Challenges and opportunities

et al. 2018

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a b s t r a c t a r t i c l e i n f oWe discuss the challenge of selecting materials for nuclear applications and outline the need for comprehensive databases to assist scientists and engineers in choosing materials that meet interdependent physical, chemical, and nuclear criteria. In conventional engineering, chemical and physical properties and the electronic structure of materials are typically the primary considerations; nuclear applications must also consider the nuclear physics characteristics of a material. Development of databases that correlate physical, chemical, and nuclear properties would accelerate and facilitate innovations in nuclear design.

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Thermo-mechanical properties of alumina films created using the atomic layer deposition technique

Cited by 84 publications

References 90 publications

Reinforcing nanocolloidal crystals by tuning interparticle bonding via atomic layer deposition

Reinforcing nanocolloidal crystals by tuning interparticle bonding via atomic layer deposition

Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

Materials selection for nuclear applications: Challenges and opportunities

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