Thermionic vacuum arc (TVA) technique for magnesium thin film deposition

The structural, optical and morphological properties of CaF2 thin films by using Thermionic Vacuum Arc (TVA)

“…The RMS roughness value of CaF 2 film surfaces calculated in this way was found to be 10 nm. These results show that the TVA produced CaF 2 thin films are compact, smooth, homogeneous and they possess a nanostructure which is in good agreement with the TVA literature [17][18][19][20][21][22][23][24].…”

“…The TVA technique for depositing thin films utilizes a plasma discharge source which generates pure metal and non-metal plasma. The TVA discharge occurs between cathode and anode under high or ultra high vacuum conditions [17][18][19][20][21][22][23][24]. The cathode in the Wehnelt cylinder contains a heated tungsten filament which emits electrons and the anode contains the substrate material to be coated.…”

“…A steady state concentration of the evaporated atoms of anode materials is established quickly in the medium between the anode and the cathode. With further increase in the accelerating dc voltage, a bright thermionic vacuum arc occurs in the vacuum chamber due to the vaporized atoms of the anode material [17][18][19][20][21][22][23][24]. Under the suitable pressure in the vacuum chamber, the generated plasma material deposited on the substrate forms a thin film.…”

“…They are also compact and nanostructured. Moreover deposition time in this technique is very short [17][18][19][20][21][22][23][24].…”

Effect of Thickness on Magnetic Properties of Fe36Co36B19.2Si4.8Mo2W2Thin Film Prepared by Thermionic Vacuum Arc

“…Another method to produce thin films is thermionic vacuum arc (TVA). Thin films prepared by TVA method are compact and nanostructured, having also high quality, high purity, and low roughness [6].…”