2016
DOI: 10.1364/josab.33.002395
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Thermally managed Z-scan methods investigation of the size-dependent nonlinearity of graphene oxide in various solvents

Abstract: Thermally managed Z-scan using a modified chopper was compared to the utilization of a pulse picker with the common calibration material carbon disulfide and then extended to graphene oxide (GO) in different solvents at λ 800 nm. GO in distilled water using femtosecond laser excitation yielded a value of −2.7 :4 × 10 −15 cm 2 ∕W for nanometer particles and −1.6 :6 × 10 −15 cm 2 ∕W for micrometer-sized particles. Openaperture Z-scan results using the modified chopper showed no experimental difference.

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Cited by 16 publications
(10 citation statements)
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“…Third-order nonlinearities of the 120nm thick films were measured using the thermally managed Z-scan [10]. The experimental setup is based on standard Z-scan [11] (see fig.…”
Section: Experiments and Resultsmentioning
confidence: 99%
“…Third-order nonlinearities of the 120nm thick films were measured using the thermally managed Z-scan [10]. The experimental setup is based on standard Z-scan [11] (see fig.…”
Section: Experiments and Resultsmentioning
confidence: 99%
“…This effectively lowers the repetition rate and allows the sample to cool between bursts or groups of pulses, allowing the extraction of the electronic nonlinear optical properties of the sample. Calibration of the Z-scan setup was conducted using the well-known liquid CS2 (see calibration results in supporting information) as described by Sheik-Bahae 18 and Burkins 19 . The measured n2 value of CS2 was 2.48±0.1x10 -15 cm 2 /W which is close to the excepted value of 2.4x10 -15 cm 2 /W.…”
Section: Nonlinear Optical Properties Evaluation Z-scan Is An Establmentioning
confidence: 99%
“…Diagram of thermally-managed Z-scan setup19 used in the nonlinear measurements. The setup shows the modified optical chopper, 800 nm 130 fs laser system, reference, CA and OA detectors, various focusing lenses and sample translation stage.…”
mentioning
confidence: 99%
“…TiO2 films, with a 120-nm nominal thickness, were deposited by ALD at temperatures ranging from 100-300ºC on quartz substrates, were studied using a femtosecond thermally managed Z-scan technique 9 . TiO2 films prepared by physical vapor deposition (PVD) at room temperature were used as control samples.…”
mentioning
confidence: 99%