2016
DOI: 10.1063/1.4949327
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Thermal diffusion boron doping of single-crystal natural diamond

Abstract: Abstract:With the best overall electronic and thermal properties, single crystal diamond (SCD) is the extreme wide bandgap material that is expected to revolutionize power electronics and radio-frequency electronics in the future. However, turning SCD into useful semiconductors requires overcoming doping challenges, as conventional substitutional doping techniques, such as thermal diffusion and ion implantation, are not easily applicable to SCD. Here we report a simple and easily accessible doping strategy … Show more

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Cited by 32 publications
(16 citation statements)
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References 57 publications
(92 reference statements)
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“…This is due to not only the limitation of the deposition area (B1 Â 1 cm 2 ) for single crystal diamond plates, 4,5 but also to the difficulty in band gap engineering. 6,7 Doping an impurity is an ideal way to band gap engineer a semiconducting material and this has opened up the use of silicon in the current era. For diamond with a wide band gap of 5.47 eV, however, the doping approach revealed difficulty in controlling the dopants as well as degradation of crystallinity with heavy doping of boron or nitrogen.…”
mentioning
confidence: 99%
See 1 more Smart Citation
“…This is due to not only the limitation of the deposition area (B1 Â 1 cm 2 ) for single crystal diamond plates, 4,5 but also to the difficulty in band gap engineering. 6,7 Doping an impurity is an ideal way to band gap engineer a semiconducting material and this has opened up the use of silicon in the current era. For diamond with a wide band gap of 5.47 eV, however, the doping approach revealed difficulty in controlling the dopants as well as degradation of crystallinity with heavy doping of boron or nitrogen.…”
mentioning
confidence: 99%
“…For diamond with a wide band gap of 5.47 eV, however, the doping approach revealed difficulty in controlling the dopants as well as degradation of crystallinity with heavy doping of boron or nitrogen. 6 The latter problem is more radical because it is due to a change of gas chemistry during the in situ doping. Boron and nitrogen doping through implantation increases the conductance of diamond.…”
mentioning
confidence: 99%
“…It was also unclear whether this boron doping was substitutional, and how large the stress was, caused by this thermal diffusion process. Obviously, the capability of both n-type and p-type doping of UNCD, combined with the well-controlled nanostructure fabrication technique described below, opens the access to enormous applications using the semiconductor property of diamond, such as field emission (FE) based miniatured devices [34], photovoltaic and energy storage devices [35], water treatment, electrochemical devices [36], biosensors and bioactuators such as nerve stimulating electrodes [37], sensors based on piezoresistivity effect, and power electronics [38].…”
Section: Synthesis Of Uncd Filmsmentioning
confidence: 99%
“…The doping can be carried out by nitric acid oxidation (Ray et al 2009 ). To obtain uniformly doped diamond has been a significant technological challenge, but this challenge is being successfully faced (Seo et al 2016 .…”
Section: Nanodiamondsmentioning
confidence: 99%