1986
DOI: 10.1016/0040-6090(86)90092-1
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Thermal annealing behaviour of Si/SiO2 structures

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Cited by 12 publications
(11 citation statements)
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“…In addition, we observed in all noncalcined samples the bands associated with the presence of OH groups. In addition, we can note that "Peak 3" corresponds to the symmetrical elongation of the Si-OH bond [22] "Peak 5" to the deformation of the OH bonds of the adsorbed water [22] and "Peak 7" to the overlap of the elongation peak of the OH hydrogen bond from water molecules Before and after thermal treatment, all SiNPs show the bands associated with the movement of oxygen in the SiO 2 network: the swing "Peak 1" [22], symmetrical elongation "Peak 2" [22] and asymmetrical elongation "Peak 4" [22], as well as the shoulder at approximately 1200 cm −1 , which is generally interpreted as an additional signature of the amorphous SiO 2 network [17]. Thermal treatment causes displacement of the main peak at about 1100 cm −1 "Peak 4" to a higher wavenumber: 1059-1081, 1047-1078 and 1068-1079 cm −1 for SiNP10:YEu, SiNP50:YEu and SiNP100:YEu, respectively.…”
Section: Resultsmentioning
confidence: 99%
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“…In addition, we observed in all noncalcined samples the bands associated with the presence of OH groups. In addition, we can note that "Peak 3" corresponds to the symmetrical elongation of the Si-OH bond [22] "Peak 5" to the deformation of the OH bonds of the adsorbed water [22] and "Peak 7" to the overlap of the elongation peak of the OH hydrogen bond from water molecules Before and after thermal treatment, all SiNPs show the bands associated with the movement of oxygen in the SiO 2 network: the swing "Peak 1" [22], symmetrical elongation "Peak 2" [22] and asymmetrical elongation "Peak 4" [22], as well as the shoulder at approximately 1200 cm −1 , which is generally interpreted as an additional signature of the amorphous SiO 2 network [17]. Thermal treatment causes displacement of the main peak at about 1100 cm −1 "Peak 4" to a higher wavenumber: 1059-1081, 1047-1078 and 1068-1079 cm −1 for SiNP10:YEu, SiNP50:YEu and SiNP100:YEu, respectively.…”
Section: Resultsmentioning
confidence: 99%
“…Before and after thermal treatment, all SiNPs show the bands associated with the movement of oxygen in the SiO 2 network: the swing “Peak 1” [ 22 ], symmetrical elongation “Peak 2” [ 22 ] and asymmetrical elongation “Peak 4” [ 22 ], as well as the shoulder at approximately 1200 cm −1 , which is generally interpreted as an additional signature of the amorphous SiO 2 network [ 17 ]. Thermal treatment causes displacement of the main peak at about 1100 cm −1 “Peak 4” to a higher wavenumber: 1059–1081, 1047–1078 and 1068–1079 cm −1 for SiNP10:YEu , SiNP50:YEu and SiNP100:YEu , respectively.…”
Section: Resultsmentioning
confidence: 99%
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“…Finally, a strong band around 1100 cm −1 (labeled “4”) is assigned to the Si–O–Si asymmetric stretching mode where the bridging oxygen atoms move horizontally in to the Si–O–Si plane [ 41 , 42 , 43 , 44 , 45 ]. In addition, the shoulder at about 1200 cm −1 is generally interpreted as a sign of the amorphous network of SiO 2 [ 30 ].…”
Section: Resultsmentioning
confidence: 99%
“…Finally, the heat treatment effect on the photoluminescence properties of the materials was investigated by annealing all samples at 900 °C. The thermal treatment of the materials has some significant effects on the silica structure, such as promoting the SiO 2 condensation in the three-dimensional network which lead to more organized structure after decreasing of the silanol group concentration (Si–OH) [ 30 , 31 , 32 , 33 ].…”
Section: Introductionmentioning
confidence: 99%