Thermal and Photoinduced Covalent Attachment of 3-Chloro-1-propanol on Si(100)-2×1

Abstract

3-Chloro-1-propanol (HO−CH2−CH2−CH2−Cl) covalently binds onto Si(100)-2×1 through the thermal dissociation of the OH group to form Si−O−CH2−CH2−CH2−Cl surface intermediates, evidenced by the appearance of the Si−H stretching mode (2110 cm−1) and the retention of C−Cl stretching mode (654 cm−1) in the high-resolution electron energy loss spectroscopy (HREELS) spectrum of chemisorbed 3-chloro-1-propanol molecules and the chemical downshift of O1s binding energy (BE) in the X-ray photoelectron spectroscopy (XPS) study. The C−Cl bonds in the chemisorbed 3-chloro-1-propanol can be cleaved upon 193 nm irradiation, resulting in Si−O−CH2CH2CH2−CH2CH2CH2−O−Si through lateral diradical coupling. Upon covering the chemisorbed 3-chloro-1-propanol with physisorbed molecules, photoinduced diradical coupling between physisorbed and chemisorbed molecules was also evidenced, achieving the secondary attachment of 3-chloro-1-propanol on the Si surface and forming Si−O−CH2CH2CH2−CH2CH2CH2−OH.

Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions

“…The upshift of 0.4 eV for the main O 1s peaks between the two different reactions suggested that the OH-group of the ethynylbenzyl alcohol has different environments with respect to the surface. During thermal hydrosilylation, the lower binding energy can only suggest that OH had been cleaved to form a linkage to the surface as previously reported by Shao et al [ 34 ]. Although in both of the mentioned linkages (Si–O–C and C–OH) in this paper, the carbon atoms are technically sp 3 hybridized.…”

Formation of stable Si–O–C submonolayers on hydrogen-terminated silicon(111) under low-temperature conditions

“…The upshift of 0.4 eV for the main O 1s peaks between the two different reactions suggested that the OH-group of the ethynylbenzyl alcohol has different environments with respect to the surface. During thermal hydrosilylation, the lower binding energy can only suggest that OH had been cleaved to form a linkage to the surface as previously reported by Shao et al [34]. Although in both of the mentioned linkages (Si-O-C and C-OH) in this paper, the carbon atoms are technically sp 3 hybridized.…”

Multiscale Effects of Interfacial Polymer Confinement in Silica Nanocomposites

“…The C 1s spectra of both F-SBR and B-SBR at the SiO 2 layer (which is present after piranha etching silicon) show a main emission near 285.3 eV assigned to aliphatic and aromatic CC bonds (Figure a). − Spectral fitting reveals that the spectra for the F-SBR–SiO 2 interface contain a second peak near 286.4 eV, which can be assigned to C–Si–O or Si–C bonds coming from the Si–OH end functional groups at the end of F-SBR chains. − This additional peak supports the conclusion from SFG that the Si–OH end functional groups are condensed at polymer–Si wafer interface and not in the bulk film (Figure S6a). Looking next at the corresponding O 1s spectra of both polymers at SiO 2 layer, we observe a common peak at 531.8 eV originating from Si–O bonds at the Si wafer surface. , Similar to the C 1s spectra, we identified an additional peak after fitting the O 1s spectrum for F-SBR (Figure b).…”

“…Looking next at the corresponding O 1s spectra of both polymers at SiO 2 layer, we observe a common peak at 531.8 eV originating from Si–O bonds at the Si wafer surface. , Similar to the C 1s spectra, we identified an additional peak after fitting the O 1s spectrum for F-SBR (Figure b). The second peak near 533.7 eV can be assigned to Si–O–R and Si–O–Si bonds ,, and appears only at the F-SBR–silica interfacenot in the bulk film (Figure S6b).…”