1970
DOI: 10.1016/0038-1101(70)90142-5
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Theory of low frequency noise in Si MOST's

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Cited by 72 publications
(10 citation statements)
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“…Two major theories have been developed to explain the physical origin of flicker (1/ f ) noise in MOS devices, namely, the number fluctuation theory (NFT) [ 25 , 26 , 27 ] originally proposed by McWhorter [ 28 ] and the bulk mobility fluctuation theory (MFT) based on Hooge’s model [ 29 ]. According to the NFT, flicker noise arises from random trapping and detrapping of carriers at defects near the MOS surface and near the MOS/insulator interface (ZnO/SiO 2 interface in this study).…”
Section: Electrical Characterizationmentioning
confidence: 99%
“…Two major theories have been developed to explain the physical origin of flicker (1/ f ) noise in MOS devices, namely, the number fluctuation theory (NFT) [ 25 , 26 , 27 ] originally proposed by McWhorter [ 28 ] and the bulk mobility fluctuation theory (MFT) based on Hooge’s model [ 29 ]. According to the NFT, flicker noise arises from random trapping and detrapping of carriers at defects near the MOS surface and near the MOS/insulator interface (ZnO/SiO 2 interface in this study).…”
Section: Electrical Characterizationmentioning
confidence: 99%
“…This simulation was run 50 times and averaged to reduce error. Analogous to [8], to simulate the effect of multiple traps with different time constants, all traps are assumed statistically independent of each other. The RTS generated by each trap can then be added to compute the total noise.…”
Section: Simulation Of Flicker Noise In DC Biased Transistorsmentioning
confidence: 99%
“…Various experimental observations have suggested that the surface of the semiconductor can cause type noise [7], [8], [17], [18]. The surface noise is attributed to the existence of traps at the semiconductor surface and deep-level traps inside the oxide and oxide-semiconductor interface [17], [19], [20]- [22]. McWhorter lifetime distribution using a model based on the tunneling of the carriers from semiconductor surface to the traps within the oxide and oxide semiconductor interface was used to explain the surface noise [1], [22].…”
Section: Simplified Picture Of Traps Responsible For Low-frequenmentioning
confidence: 99%
“…The surface noise is attributed to the existence of traps at the semiconductor surface and deep-level traps inside the oxide and oxide-semiconductor interface [17], [19], [20]- [22]. McWhorter lifetime distribution using a model based on the tunneling of the carriers from semiconductor surface to the traps within the oxide and oxide semiconductor interface was used to explain the surface noise [1], [22]. On the contrary, in the theory presented here, there is no need to account for a tunneling mechanism to explain surface noise.…”
Section: Simplified Picture Of Traps Responsible For Low-frequenmentioning
confidence: 99%
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