Theory of Auger neutralization and deexcitation of slow ions at metal surfaces

Cazalilla, Miguel A.; Lorente, Nicolás; Muiño, R. Dı́ez; Gauyacq, J.P.; Teillet‐Billy, D.; Echenique, Pedro M.

doi:10.1103/physrevb.58.13991

Cited by 139 publications

(76 citation statements)

References 74 publications

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“…Institute of Physics ⌽ DEUTSCHE PHYSIKALISCHE GESELLSCHAFT the metal-vacuum interface [8]. Nevertheless, it has been suggested by numerical calculations that, as a good approximation, the dependence on the distance d and the energy ω factorize [9] as…”

Section: Both Effects Combined Lead To a Sizable Underestimate Of T(d)mentioning

confidence: 99%

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The healing mechanism for excited molecules near metallic surfaces

Barbiellini

Platzman²

2006

New J. Phys.

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Radiation damage prevents the ability to obtain images from individual molecules. We suggest that this problem can be avoided for organic molecules by placing them in close proximity with a metallic surface. The molecules will then quickly dissipate any electronic excitation via their coupling to the metal surface. They may therefore be observed for a number of elastic scattering events that is sufficient to determine their structure.

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Section: Both Effects Combined Lead To a Sizable Underestimate Of T(d)mentioning

confidence: 99%

“…Our study involves the neutralization of physisorbed molecules on metallic surfaces. Given the wide range of estimates of the neutralization time in previous work [8], we must perform a conservative estimate to demonstrate the feasibility of the healing mechanism in our case.…”

mentioning

confidence: 99%

The healing mechanism for excited molecules near metallic surfaces

Barbiellini

Platzman²

2006

New J. Phys.

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“…A "piling up" of metallic charge on the ion was considered in the calculations of neutralization rates of multiply charged ion inside metals [114]. A detailed investigation of the effect for the case of Auger neutralization of He + at a jellium surface, was tackled by Cazalilla et al [115] who considered the 3D nature of the problem, including excited terms of the He atom. In this way they included not only the pure AN process of Fig.…”

Section: Jellium Modelmentioning

confidence: 99%

Auger neutralization and ionization processes for charge exchange between slow noble gas atoms and solid surfaces

Monreal

2014

Progress in Surface Science

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Electron and energy transfer processes between an atom or molecule and a surface are extremely important for many applications in physics and chemistry. Therefore a profound understanding of these processes is essential in order to analyze a large variety of physical systems. The microscopic description of the two-electron Auger processes, leading to neutralization/ionization of an ion/neutral atom in front of a solid surface, has been a long-standing problem. It can be dated back to the 1950s when H. D. Hagstrum proposed to use the information contained in the spectrum of the electrons emitted during the neutralization of slow noble gas ions as a surface analytical tool complementing photoelectron spectroscopy. However, only recently a comprehensive description of the Auger neutralization mechanism has been achieved by the combined efforts of theoretical and experimental methods. In this article we review the theoretical models for this problem, stressing how their outcome compare with experimental results. We also analyze the inverse problem of Auger ionization. We emphasize the understanding of the key quantities governing the processes and outline the challenges remaining. This opens new perspectives for future developments of theoretical and experimental work in this field.

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“…Closer to the graphene surface, these energetic ions will undergo dissociative recombination to form neutral, but energetic, H radicals. For example, two possible branching reactions for H are H H and 3H [21,22].…”

Section: Introductionmentioning

confidence: 99%

Plasma-graphene interaction and its effects on nanoscale patterning

2016

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Scalable and precise nano-patterning of graphene is an essential step for graphene-based device fabrication. Hydrogen-plasma reactions have been shown to narrow graphene only from the edges, or to selectively produce circular or hexagonal holes in the basal plane of graphene, but the underlying plasma-graphene chemistry is unknown. Here, we study the hydrogen-plasma etching of monolayer graphene supported on SiO 2 substrates across the range of plasma ion energies using scale-bridging molecular dynamics (MD) simulations based on reactive force-field potential. Our results uncover distinct etching mechanisms, operative within narrow ion energy windows, which fully explain the differing plasma-graphene reactions observed experimentally. Specific ion energy ranges are demonstrated for stable isotropic (~2 eV) versus anisotropic hole growth (~20-30 eV) within the basal plane of graphene, as well as for pure edge etching of graphene (~1 eV). Understanding the complex plasma-graphene chemistry opens up a means for controlled patterning of graphene nanostructures.

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Theory of Auger neutralization and deexcitation of slow ions at metal surfaces

Cited by 139 publications

References 74 publications

The healing mechanism for excited molecules near metallic surfaces

The healing mechanism for excited molecules near metallic surfaces

Auger neutralization and ionization processes for charge exchange between slow noble gas atoms and solid surfaces

Plasma-graphene interaction and its effects on nanoscale patterning

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