2003
DOI: 10.1016/s0022-0248(02)02406-5
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Theoretical study of In desorption and segregation kinetics in MBE growth of InGaAs and InGaN

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Cited by 20 publications
(9 citation statements)
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“…This deficiency of active N suggests the presence of a physisorbed In/In-methyl surface layer. This is clear by the saturation in In-methyl desorption above 560 1C, consistent with InGaAs [21,22] and InGaN MBE studies [22]. The ability of the In/In-methyl surface layer to block NH 3 adsorption sites and terminate In x Ga 1Àx N growth [23] is apparent in cases of low NH 3 flow and low Ga/In.…”
Section: Discussionsupporting
confidence: 72%
“…This deficiency of active N suggests the presence of a physisorbed In/In-methyl surface layer. This is clear by the saturation in In-methyl desorption above 560 1C, consistent with InGaAs [21,22] and InGaN MBE studies [22]. The ability of the In/In-methyl surface layer to block NH 3 adsorption sites and terminate In x Ga 1Àx N growth [23] is apparent in cases of low NH 3 flow and low Ga/In.…”
Section: Discussionsupporting
confidence: 72%
“…The Mg valve position was then adjusted to obtain differing levels of Mg doping. The effect of MME growths on InGaN were found to be detrimental due to the high desorption rate [23,24], and low residency of In. Figure 1 SIMS data for Mg-doped GaN step profiles for an unmodulated, droplet-free growth (Mg1), and a smart-shuttering MME growth (Mg2) with similar growth conditions.…”
Section: Methodsmentioning
confidence: 99%
“…The indium surface segregation can be observed using the transition electron microscopy (TEM) [5], [6], reflection high energy electron diffraction (RHEED) [7] and X-rays diffraction (XRD) [8]. However, all these methods have own disadvantages in case of ultrathin QWs.…”
Section: Light-emitting Diodes and Semiconductor Lasers Based Onmentioning
confidence: 99%