Abstract:A theoretical study of the electronic structure of periodically 6doped GaAs Is presented. When the doping period is reduced, minibends are formed, and the photoluminescence spectrum presents a broad emission band at energies above the GaAs band edge. The experimentally obtained photoluminescence lineshape is well reproduced by the theory. The calculated cut-off energy in the photoluminescence spectrum is in excellent agreement with the experimental value. The Fermi surface is studied as a function of the dopin… Show more
“…2 is the net charge distribution profile obtained from C-V measurements in sample 187 which has a single &doped layer. The profile shows a FWHM equal to 35w corresponding to an atomic distribution of around 8 A [20], as determined by solving self-consistently the Poisson and Schrodinger equations within the Hartree approximation for the gated delta-doped structure [3,12], once the sheet dopant concentration is known. The dopant localization is used as an input parameter so that the real atomic localization corresponds to the one which gives a theoretical CV profile that best agrees with the experimental one.…”
Section: Methodsmentioning
confidence: 99%
“…The value of dc is possibly also a function of both the sheet doping concentration [12] and localization. Further investigation is required for a better quantitative understanding of this phenomenon.…”
Section: 50mentioning
confidence: 99%
“…The high energy cut-off, hvCut.,fr, represented by an arrow in Fig. 7 is given by where V is the effective V-shaped potential, E, is the Fermi energy for the conduction miniband measured from the bottom of the V potential and Eh is the Fermi energy for the holes measured from the top of the V potential [11,12,17]. Both E, and Eh should increase with decreasing period, consequently increasing hv,,t-,ff as it is observed in this investigation.…”
Section: 50mentioning
confidence: 99%
“…Such slight discrepancy is positively surprising if one considers that the substitution of N 3 D by N2D/d in Eq. (4) should only be valid for d 5 80 A [12]. The theoretical curve where A is given by the InP bandgap and the coefficient of d-2'3 is calculated using N 2 0 measured by Hall effect is represented in Fig.…”
Single Si &doped InP samples were grown at 640°C with different doping concentrations. A full width at half maximum for the net charge concentration profile of 32A was obtained, which corresponds to an impurity localization over less than 8 A according to numerical simulations. No dopant diffusion or segregation was observed. A series of periodically Si 6-doped InP structures with 5 and 10 periods varying from 92 to 278 A has been investigated. A reduction in mobility with decreasing period was observed due to the increasing overlap of the electronic wavefunction with the various Si planes. A broad band photoluminescence emission was detected for the periodic structures at energies higher than the InP band gap. Its intensity decreases with a reduction in the period indicating the 3D character of the sample. The cutoff energy for this band decreases with the period and this behavior can be described by a d-2'3 decay which is expected from a 3-dimensional system.
“…2 is the net charge distribution profile obtained from C-V measurements in sample 187 which has a single &doped layer. The profile shows a FWHM equal to 35w corresponding to an atomic distribution of around 8 A [20], as determined by solving self-consistently the Poisson and Schrodinger equations within the Hartree approximation for the gated delta-doped structure [3,12], once the sheet dopant concentration is known. The dopant localization is used as an input parameter so that the real atomic localization corresponds to the one which gives a theoretical CV profile that best agrees with the experimental one.…”
Section: Methodsmentioning
confidence: 99%
“…The value of dc is possibly also a function of both the sheet doping concentration [12] and localization. Further investigation is required for a better quantitative understanding of this phenomenon.…”
Section: 50mentioning
confidence: 99%
“…The high energy cut-off, hvCut.,fr, represented by an arrow in Fig. 7 is given by where V is the effective V-shaped potential, E, is the Fermi energy for the conduction miniband measured from the bottom of the V potential and Eh is the Fermi energy for the holes measured from the top of the V potential [11,12,17]. Both E, and Eh should increase with decreasing period, consequently increasing hv,,t-,ff as it is observed in this investigation.…”
Section: 50mentioning
confidence: 99%
“…Such slight discrepancy is positively surprising if one considers that the substitution of N 3 D by N2D/d in Eq. (4) should only be valid for d 5 80 A [12]. The theoretical curve where A is given by the InP bandgap and the coefficient of d-2'3 is calculated using N 2 0 measured by Hall effect is represented in Fig.…”
Single Si &doped InP samples were grown at 640°C with different doping concentrations. A full width at half maximum for the net charge concentration profile of 32A was obtained, which corresponds to an impurity localization over less than 8 A according to numerical simulations. No dopant diffusion or segregation was observed. A series of periodically Si 6-doped InP structures with 5 and 10 periods varying from 92 to 278 A has been investigated. A reduction in mobility with decreasing period was observed due to the increasing overlap of the electronic wavefunction with the various Si planes. A broad band photoluminescence emission was detected for the periodic structures at energies higher than the InP band gap. Its intensity decreases with a reduction in the period indicating the 3D character of the sample. The cutoff energy for this band decreases with the period and this behavior can be described by a d-2'3 decay which is expected from a 3-dimensional system.
“…35 The exchange-correlation potential is usually taken in the approximation of Hedin and Lundqvist 36 and standard self-consistent numerical methods can be then used. [37][38][39][40] However, the nonlinear TF formulation of the δ doping has been proven to be equivalent to the self-consistent (Hartree) model in a wide range of doping densities. [41][42][43][44] The advantage of the TF formulation is that Poisson and Schrödinger equations are effectively decoupled and their solution is easier.…”
A topological boundary can be formed at the interface between a trivial and a topological insulator. The difference in the topological index across the junction leads to robust gapless surface states. Optical studies of these states are scarce in the literature, the reason being the difficulty to isolate their response from that of the bulk. In this work, we propose to deposit a δ layer of donor impurities in close proximity to a topological boundary to help detecting gapless surface states. As we will show, gapless surface states are robust against this perturbation and they enhance intraband optical transitions as measured by the oscillator strength. These results allow to understand the interplay of surface and bulk states in topological insulators.
The photoluminescence of periodically δ‐doped InP was measured at 4.2 K in magnetic fields of intensity between 0 and 14 T. The samples has a nearly constant carrier density of 5.0×1012 cm—2 and doping period varying from 130 to 245 Å. A well defined fan diagram associated with the optical recombination of electrons in the E2 miniband and photoexcited holes is obtained. Extrapolation of the Landau level fan diagram to zero field allows us to estimate the band gap renormalization (BGR). The BGR decreases rapidly when the period of the superlattice is increased. The BGR observed can be accounted for by the density of non‐confined (three‐dimensional) electrons present in the structure.
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