The thermal expansion of 3C–SiC in TRISO particles by high temperature X-ray diffraction

Abstract

The lattice parameter change of SiC in TRISO particles prepared by chemical vapour deposition (CVD) was measured using high temperature X-ray diffraction, across a temperature range of 25 to 1400°C. Al 2 O 3 was used as the internal standard and the SiC temperature corrections were calibrated using its two independent lattice parameter values along the a-and c-axes. Experimental unit cell values of SiC at low temperatures corresponded well with those published in previous literature, but deviated systematically at higher temperatures. Thermal expansion coefficients of the CVD prepared SiC shell material are considered the most accurate and follow a linear trend with increasing temperature (α 11 = 2.7706 x 10 -9 T + 3.3048 x 10 -6 K -1 ). The TRISO particles are described best using non-linear expansion coefficients. Apparent is the deviation in the SiC lattice constants of the shell material and the TRISO particles from which it originated. This could indicate a residual strain in the TRISO particles or a difference in sample displacement between the TRISO particles and the surrounding alumina standard. The room temperature lattice constant for the shell material is 4.36030Å (SD 0.00006Å) as compared with that of the TRISO sample of 4.35835Å (SD 0.00006Å) after adjusting the sample displacement to get alumina lattice constants as close to the accepted values. Residual stress of ~300MPa is calculated from the lattice constant differences.

Simulasi Diameter Gel Basah Pada Fabrikasi Kernel Yttria-Stabilized Zirconia Menggunakan Alat Gel-Casting

“…Bagian tengah dari partikel terlapisi adalah kernel yang dibuat dari uranium oksida (UO 2 ) [3,4], uranium karbida (UC+UC 2 ) [4], uranium oksikarbida (UCO) [4,5] dan uranium nitrida [6]. Kernel ini kemudian dilapisi dengan beberapa lapisan yang terdiri dari lapisan buffer, lapisan pyrolytic carbon (IPyC and OPyC) and silikon karbida (SiC) [3,7] untuk membentuk tri-structural isotropic (TRISO) [7] menggunakan alat fluidized bed chemical vapor deposition [8,9].…”